SCHEMBL352190

SCHEMBL352190

C=CCOCC(=C)C(=O)OCCOc1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.55
SMN1; SMN2 Q16637 4/20 0.44
KDM4E B2RXH2 2/20 0.44
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
RAB9A P51151 5/20 0.43
NPC1 O15118 3/20 0.43
TSHR P16473 1/20 0.43
PKM P14618 1/20 0.42
CASP1 P29466 2/20 0.42
ALDH1A1 P00352 3/20 0.42
HPGD P15428 1/20 0.42
NFKB1 P19838 1/20 0.42
NFKB2 Q00653 1/20 0.42
RELA Q04206 1/20 0.42
HSD17B10 Q99714 1/20 0.42
PARP10 Q53GL7 1/20 0.40
GLA P06280 1/20 0.39
GAA P10253 1/20 0.39
HTT P42858 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL352600 0.97 THRB (0.52) THRBSMN1; SMN2KDM4EMEN1KMT2A
SCHEMBL29182462 0.84 THRB (0.57) THRBSMN1; SMN2KDM4EMEN1KMT2A
SCHEMBL26927387 0.82 THRB (0.49) THRBSMN1; SMN2KDM4EMEN1KMT2A
SCHEMBL25803000 0.82 KDM4E (0.44) THRBSMN1; SMN2KDM4EMEN1KMT2A
SCHEMBL351044 0.81 CYP3A4 (0.40) THRBSMN1; SMN2KDM4EMEN1KMT2A
SCHEMBL352189 0.80 THRB (0.47) THRBSMN1; SMN2KDM4EMEN1KMT2A
SCHEMBL352599 0.80 THRB (0.47) THRBSMN1; SMN2KDM4EMEN1KMT2A
SCHEMBL25803012 0.79 ALDH1A1 (0.44) THRBTSHRALDH1A1HSD17B10CYP3A4
SCHEMBL25803009 0.79 ALDH1A1 (0.44) THRBTSHRALDH1A1HSD17B10CYP3A4
SCHEMBL25803015 0.79 ALDH1A1 (0.44) THRBTSHRALDH1A1HSD17B10CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024128086-A1 CURABLE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE 富士フイルム株式会社 2024-06-20 WO disclosed
US-11987658-B2 Curable resin composition and method of manufacturing article CANON KABUSHIKI KAISHA (JP) 2024-05-21 US disclosed
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
WO-2023195398-A1 ADHESIVE COMPOSITION, ADHESIVE FILM FOR CIRCUIT CONNECTION, CIRCUIT CONNECTION STRUCTURE, AND METHOD OF PRODUCING SAME 株式会社レゾナック 2023-10-12 WO disclosed
WO-2023127300-A1 NON-AQUEOUS SECONDARY BATTERY BINDER POLYMER, NON-AQUEOUS SECONDARY BATTERY BINDER COMPOSITION, AND NON-AQUEOUS SECONDARY BATTERY ELECTRODE 株式会社レゾナック 2023-07-06 WO disclosed
US-20220282013-A1 CURABLE RESIN COMPOSITION AND METHOD OF MANUFACTURING ARTICLE CANON KABUSHIKI KAISHA (JP) 2022-09-08 US disclosed
US-20180037758-A1 Ink Composition For Three-Dimensional Modeling, Ink Set, And Method For Producing Three-Dimensional Model Konica Minolta, Inc. (JP) 2018-02-08 US disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2383317-B1 ALPHA-ALLYLOXYMETHYLACRYLIC ACID-BASED COPOLYMER, RESIN COMPOSITION, AND USE THEREOF NIPPON CATALYTIC CHEM IND (JP) 2013-10-23 EP disclosed
US-8497332-B2 α-Allyloxymethylacrylic acid-based copolymer, resin compositions, and use thereof NIPPON SHOKUBAI CO., LTD. (JP) 2013-07-30 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed
EP-2383317-A1 ALPHA-ALLYLOXYMETHYLACRYLIC ACID-BASED COPOLYMER, RESIN COMPOSITION, AND USE THEREOF Nippon Shokubai Co., Ltd. (JP) 2011-11-02 EP disclosed
US-20110263805-A1 ALPHA-ALLYLOXYMETHYLACRYLIC ACID-BASED COPOLYMER, RESIN COMPOSITIONS, AND USE THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2011-10-27 US disclosed