SCHEMBL351044

SCHEMBL351044

C=CCOCC(=C)C(=O)Oc1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.40
ELANE P08246 1/20 0.39
CASP1 P29466 1/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
GAA P10253 2/20 0.38
RAB9A P51151 2/20 0.38
GLA P06280 1/20 0.38
HTT P42858 1/20 0.38
ALOX15 P16050 1/20 0.37
THRB P10828 1/20 0.36
KDM4E B2RXH2 2/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
ALDH1A1 P00352 3/20 0.36
BACE1 P56817 1/20 0.36
TSHR P16473 1/20 0.36
HSD17B10 Q99714 1/20 0.36
PKM P14618 1/20 0.35
NPC1 O15118 1/20 0.34
ATM Q13315 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1520832 0.87 ELANE (0.45) CYP3A4ELANESMN1; SMN2ALOX15KDM4E
SCHEMBL352678 0.85 LMNA (0.42) ELANEGAAHTTTHRBKMT2A
SCHEMBL9564307 0.82 ELANE (0.41) CYP3A4ELANESMN1; SMN2ALOX15KDM4E
SCHEMBL23489458 0.81 KIF11 (0.42) RAB9AALDH1A1
SCHEMBL352190 0.81 THRB (0.55) CYP3A4CASP1SMN1; SMN2GAARAB9A
SCHEMBL352554 0.81 SMN1; SMN2 (0.43) SMN1; SMN2RAB9AHTTALOX15THRB
SCHEMBL19837912 0.81 NPSR1 (0.40) CYP3A4SMN1; SMN2HTTMEN1KMT2A
SCHEMBL313014 0.80 ELANE (0.42) CYP3A4ELANESMN1; SMN2GAARAB9A
SCHEMBL352600 0.79 THRB (0.52) CYP3A4CASP1SMN1; SMN2GAARAB9A
SCHEMBL2539459 0.79 ALDH1A1 (0.36) CYP3A4CASP1SMN1; SMN2GAARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
WO-2023127300-A1 NON-AQUEOUS SECONDARY BATTERY BINDER POLYMER, NON-AQUEOUS SECONDARY BATTERY BINDER COMPOSITION, AND NON-AQUEOUS SECONDARY BATTERY ELECTRODE 株式会社レゾナック 2023-07-06 WO disclosed
WO-2020162475-A1 CURABLE RESIN COMPOSITION キヤノン株式会社 2020-08-13 WO disclosed
US-20180037758-A1 Ink Composition For Three-Dimensional Modeling, Ink Set, And Method For Producing Three-Dimensional Model Konica Minolta, Inc. (JP) 2018-02-08 US disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed