SCHEMBL352600

SCHEMBL352600

C=CCOCC(=C)C(=O)OCCOCCOc1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.52
SMN1; SMN2 Q16637 4/20 0.42
MEN1 O00255 3/20 0.42
KMT2A Q03164 3/20 0.42
KDM4E B2RXH2 3/20 0.42
RAB9A P51151 5/20 0.42
NPC1 O15118 3/20 0.42
TSHR P16473 1/20 0.42
CASP1 P29466 2/20 0.40
ALDH1A1 P00352 2/20 0.40
PKM P14618 1/20 0.40
HPGD P15428 1/20 0.40
NFKB1 P19838 1/20 0.40
NFKB2 Q00653 1/20 0.40
RELA Q04206 1/20 0.40
HSD17B10 Q99714 1/20 0.40
PARP10 Q53GL7 1/20 0.38
GLA P06280 1/20 0.38
GAA P10253 1/20 0.38
HTT P42858 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL352190 0.97 THRB (0.55) THRBSMN1; SMN2MEN1KMT2AKDM4E
SCHEMBL25803000 0.84 KDM4E (0.44) THRBSMN1; SMN2MEN1KMT2AKDM4E
SCHEMBL25803015 0.83 ALDH1A1 (0.44) THRBTSHRALDH1A1HSD17B10CYP3A4
SCHEMBL25803009 0.83 ALDH1A1 (0.44) THRBTSHRALDH1A1HSD17B10CYP3A4
SCHEMBL25803012 0.83 ALDH1A1 (0.44) THRBTSHRALDH1A1HSD17B10CYP3A4
SCHEMBL352599 0.82 THRB (0.47) THRBSMN1; SMN2MEN1KMT2AKDM4E
SCHEMBL29182462 0.82 THRB (0.57) THRBSMN1; SMN2MEN1KMT2AKDM4E
SCHEMBL26927387 0.80 THRB (0.49) THRBSMN1; SMN2MEN1KMT2AKDM4E
SCHEMBL351044 0.79 CYP3A4 (0.40) THRBSMN1; SMN2MEN1KMT2AKDM4E
SCHEMBL31316456 0.79 THRB (0.50) THRBSMN1; SMN2MEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
WO-2023127300-A1 NON-AQUEOUS SECONDARY BATTERY BINDER POLYMER, NON-AQUEOUS SECONDARY BATTERY BINDER COMPOSITION, AND NON-AQUEOUS SECONDARY BATTERY ELECTRODE 株式会社レゾナック 2023-07-06 WO disclosed
WO-2020162475-A1 CURABLE RESIN COMPOSITION キヤノン株式会社 2020-08-13 WO disclosed
US-20180037758-A1 Ink Composition For Three-Dimensional Modeling, Ink Set, And Method For Producing Three-Dimensional Model Konica Minolta, Inc. (JP) 2018-02-08 US disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed