SCHEMBL353669

SCHEMBL353669

CC(C)(c1ccc(O)cc1)c1cc(C(C)(C)c2ccc(O)cc2)c(O)cc1O.Oc1ccc(Cc2ccc(O)cc2O)c(O)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.46
ESR2 Q92731 3/20 0.46
CYP3A4 P08684 3/20 0.46
TSHR P16473 2/20 0.46
HSD17B10 Q99714 2/20 0.46
AR P10275 1/20 0.46
HPGD P15428 1/20 0.46
SLC6A2 P23975 1/20 0.46
SLC6A4 P31645 1/20 0.46
HTR6 P50406 1/20 0.46
ESRRG P62508 1/20 0.46
SLC6A3 Q01959 1/20 0.46
ALOX5 P09917 3/20 0.44
TYR P14679 7/20 0.43
MEN1 O00255 2/20 0.41
MAPT P10636 2/20 0.41
KMT2A Q03164 2/20 0.41
ALDH1A1 P00352 2/20 0.41
ALOX15 P16050 2/20 0.38
HTT P42858 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL686940 0.85 ESR1 (0.62) ESR1ESR2CYP3A4TSHRHSD17B10
SCHEMBL13433997 0.80 ESR1 (0.52) ESR1ESR2CYP3A4TSHRHSD17B10
SCHEMBL246193 0.79 ESR1 (0.60) ESR1ESR2CYP3A4TSHRHSD17B10
SCHEMBL29372571 0.79 ESR1 (0.60) ESR1ESR2CYP3A4TSHRHSD17B10
SCHEMBL13609974 0.79 ESR1 (0.65) ESR1ESR2CYP3A4TSHRHSD17B10
SCHEMBL4064869 0.77 ESR1 (0.56) ESR1ESR2CYP3A4TSHRHSD17B10
SCHEMBL352398 0.77 ESR1 (0.72) ESR1ESR2CYP3A4TSHRHSD17B10
SCHEMBL29670387 0.77 ESR1 (0.72) ESR1ESR2CYP3A4TSHRHSD17B10
SCHEMBL4055230 0.76 ALDH1A1 (0.63) ESR1ESR2CYP3A4TSHRHSD17B10
SCHEMBL22271986 0.76 ESR1 (0.63) ESR1ESR2CYP3A4TSHRHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8535873-B2 Photosensitive resin composition SHOWA DENKO K.K. (JP) 2013-09-17 US disclosed
US-20120015300-A1 PHOTOSENSITIVE RESIN COMPOSITION RESONAC CORPORATION (JP) 2012-01-19 US disclosed