SCHEMBL356089

SCHEMBL356089

CCC(=O)OOC(C)CC

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
ESR1 P03372 1/20 0.33
HIF1A Q16665 1/20 0.33
NAAA Q02083 1/20 0.31
ALOX15 P16050 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5517805 0.86 TSHR (0.36) ALDH1A1
SCHEMBL25395858 0.82 FAAH (0.35)
SCHEMBL20602793 0.82 LMNA (0.44) ALDH1A1
SCHEMBL28891600 0.82 ALDH1A1 (0.46) ALDH1A1ALOX15
SCHEMBL29053697 0.80 MGAM (0.44) ALDH1A1
SCHEMBL904451 0.80
SCHEMBL1551772 0.80 ALDH1A1 (0.33) ALDH1A1
SCHEMBL10705667 0.80
SCHEMBL29460334 0.79
SCHEMBL27897119 0.79 MGAM (0.43) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 433 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10663863-B2 Method of producing layer structure, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2020-05-26 US claimed
US-10312074-B2 Method of producing layer structure, layer structure, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2019-06-04 US claimed
US-9952510-B2 Thinner composition DONGWOO FINE-CHEM CO., LTD. (KR) 2018-04-24 US claimed
US-20170198159-A1 INK COMPOSITION FOR MARKING RELEASE-TREATED SURFACE, AND PROTECTIVE FILM CONTAINING SAME LG CHEM, LTD. (KR) 2017-07-13 US claimed
US-20170115572-A1 METHOD OF PRODUCING LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2017-04-27 US claimed
CN-106414625-A Ink composition for marking release-treated surface and protective film comprising the same 株式会社LG化学 2017-02-15 CN claimed
US-20160230129-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2016-08-11 US claimed
US-9376578-B2 Stripping composition RHODIA OPERATIONS (FR) 2016-06-28 US claimed
US-20160126088-A1 METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2016-05-05 US claimed
US-20130061928-A1 ORGANIC SOLAR CELL AND METHOD OF MANUFACTURING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-03-14 US claimed
US-5496642-A VOLATILE ORGANIC CONCENTRATION, POLYURETHANES OLIN CORPORATION (US) 1996-03-05 US claimed
US-5391614-A Low-viscosity prepolymer of a polyisocyanate and a monoahl, polyol, imine or oxazolidine and a hydroxy-containing amine as catalyst; polyureas; fast-drying OLIN CORPORATION (US) 1995-02-21 US claimed
WO-1994027742-A1 ONE-COMPONENT AND TWO-COMPONENT COATING COMPOSITIONS OLIN CORPORATION (US) 1994-12-08 WO claimed
WO-1994027746-A1 MOISTURE CURABLE, TWO-COMPONENT COATING COMPOSITIONS OLIN CORPORATION (US) 1994-12-08 WO claimed
WO-1994028071-A1 MOISTURE CURABLE, ONE-COMPONENT COATING COMPOSITIONS OLIN CORPORATION (US) 1994-12-08 WO claimed
WO-1994027743-A1 MOISTURE CURABLE, ONE-COMPONENT COATING COMPOSITIONS OLIN CORPORATION (US) 1994-12-08 WO claimed
US-5370908-A Low viscosity coating OLIN CORPORATION (US) 1994-12-06 US claimed
US-5369208-A Low volatile organic coating OLIN CORPORATION (US) 1994-11-29 US claimed
US-5360642-A Low volatility organic OLIN CORPORATION (US) 1994-11-01 US claimed
WO-1994015727-A1 METHOD OF ACTIVATING N-METHYL-2-PYRROLIDONE (NMP) VARNISH AND PAINT REMOVER SOLVENTS FOR REMOVAL OF ORGANIC COATINGS ISP INVESTMENTS INC. (US) 1994-07-21 WO claimed