⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10705667 | 0.84 | — | — | |
| SCHEMBL28225601 | 0.81 | TDP1 (0.38) | — | |
| SCHEMBL2115317 | 0.81 | MGAM (0.38) | — | |
| SCHEMBL27835258 | 0.80 | — | — | |
| SCHEMBL398231 | 0.80 | ALDH1A1 (0.50) | — | |
| SCHEMBL356089 | 0.80 | ALDH1A1 (0.33) | — | |
| SCHEMBL5934857 | 0.80 | — | — | |
| SCHEMBL27584718 | 0.80 | ALDH1A1 (0.50) | — | |
| SCHEMBL123402 | 0.80 | TDP1 (0.36) | — | |
| SCHEMBL29613361 | 0.80 | TDP1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9952510-B2 | Thinner composition | DONGWOO FINE-CHEM CO., LTD. (KR) | 2018-04-24 | — | — | US | claimed |
| US-20160230129-A1 | THINNER COMPOSITION | DONGWOO FINE-CHEM CO., LTD. (KR) | 2016-08-11 | — | — | US | claimed |
| EP-4166604-B1 | CURABLE COMPOSITION | LG ENERGY SOLUTION LTD (KR) | 2026-02-18 | — | — | EP | disclosed |
| US-20230257493-A1 | Curable Composition | LG ENERGY SOLUTION, LTD. (KR) | 2023-08-17 | — | — | US | disclosed |
| EP-4166604-A1 | CURABLE COMPOSITION | LG Energy Solution, Ltd. (KR) | 2023-04-19 | — | — | EP | disclosed |
| CN-115275353-A | Fluorine-containing electrolyte for lithium battery | 天津科技大学 | 2022-11-01 | — | — | CN | disclosed |
| WO-2022071661-A1 | CURABLE COMPOSITION | 주식회사 엘지에너지솔루션 | 2022-04-07 | — | — | WO | disclosed |
| US-9952510-B2 | Thinner composition | DONGWOO FINE-CHEM CO., LTD. (KR) | 2018-04-24 | — | — | US | disclosed |
| US-20160230129-A1 | THINNER COMPOSITION | DONGWOO FINE-CHEM CO., LTD. (KR) | 2016-08-11 | — | — | US | disclosed |
| US-20160020003-A1 | OXIDE SUPERCONDUCTOR COMPOSITION, OXIDE SUPERCONDUCTOR WIRE, AND PRODUCTION METHOD FOR OXIDE SUPERCONDUCTOR WIRE | SWCC SHOWA CABLE SYSTEMS CO., LTD (JP) | 2016-01-21 | — | — | US | disclosed |
| WO-2013051805-A2 | PHOTOSENSITIVE RESIN COMPOSITION | KOLON INDUSTRIES, INC (KR) | 2013-04-11 | — | — | WO | disclosed |
| CN-1708481-A | N-alkyl-4-methyleneamino-3-hydroxy-2-pyridones as antimicrobials | PROCTER & GAMBLE (US) | 2005-12-14 | — | — | CN | disclosed |
| CN-1708482-A | N-sulfonyl-4-methyleneamino-3-hydroxy-2-pyridones as antimicrobial agents | PROCTER & GAMBLE (US) | 2005-12-14 | — | — | CN | disclosed |
| CN-1671690-A | Antimicrobial azabicyclic derivatives, compositions and uses thereof | PROCTER & GAMBLE (US) | 2005-09-21 | — | — | CN | disclosed |
| US-6610638-B1 | Reacting acrolein with alcohols, hydrogenating in presence of catalysts and distillating to recover 3-methoxy-1-propanol, used as cleaning compounds or chemical intermediates | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-26 | — | — | US | disclosed |
| EP-1085003-A1 | HIGH-PURITY 1,3-PROPANEDIOL DERIVATIVE SOLVENT, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-5827626-A | FORMING A FILM OF COLORED IMAGE FORMING MATERIAL COMPRISING A COPOLYMER OF STYRENE OR DERIVATIVE AND MONO OR DIESTER OF MALEIC ACID, PIGMENTS, PHOTOPOLYMERIZABLE UNSATURATED MONOMER, PHOTOINITIATOR; PHOTOCURING AND DEVELOPING | HITACHI CHEMICAL CO., LTD. (JP) | 1998-10-27 | — | — | US | disclosed |
| EP-0703498-B1 | Photosensitive resin composition and method for forming a photoresist pattern | MITSUBISHI CHEM CORP (JP) | 1997-12-29 | — | — | EP | disclosed |
| US-5698362-A | CONTAINING A TRIARYLMETHANE DERIVATIVE; HIGH RESOLUTION, EXCELLENT IN DEPTH OF FOCUS AND PATTERN PROFILE, STORAGE STABLE | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-12-16 | — | — | US | disclosed |
| EP-0703498-A1 | Photosensitive resin composition and method for forming a photoresist pattern | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-03-27 | — | — | EP | disclosed |