Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6566331

C[S+](C)c1cccc2c(O)cccc12.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.41

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.41
ESR1 P03372 2/20 0.41
GAA P10253 2/20 0.41
KMT2A Q03164 2/20 0.41
ESR2 Q92731 2/20 0.41
CDK2 P24941 1/20 0.41
LDHA P00338 1/20 0.38
NR4A1 P22736 1/20 0.37
KCNH2 Q12809 7/20 0.36
PSD A5PKW4 1/20 0.36
KCNJ11 Q14654 1/20 0.36
GPR3 P46089 1/20 0.36
ACHE P22303 1/20 0.35
EP300 Q09472 1/20 0.34
KAT2B Q92831 1/20 0.34
KAT8 Q9H7Z6 1/20 0.34
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
LMNA P02545 1/20 0.33
CYP1A2 P05177 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL36124 0.92 LDHA (0.44) MEN1ESR1GAAKMT2AESR2
Trifluoromethanesulfonic Acid SCHEMBL31168271 0.92 LDHA (0.44) MEN1ESR1GAAKMT2AESR2
Trifluoromethanesulfonic Acid SCHEMBL5827824 0.85 APP (0.42) MEN1ESR1GAAKMT2AESR2
Trifluoromethanesulfonic Acid SCHEMBL8853674 0.84 KCNH2 (0.38) CDK2KCNH2GPR3ACHEALDH1A1
Trifluoromethanesulfonic Acid SCHEMBL29351989 0.84 APP (0.44) MEN1ESR1GAAKMT2AESR2
Trifluoromethanesulfonic Acid SCHEMBL31168285 0.83 GPR3 (0.40) KCNH2GPR3ACHECYP1A2
Trifluoromethanesulfonic Acid SCHEMBL645454 0.83 GPR3 (0.40) KCNH2GPR3ACHECYP1A2
SCHEMBL1593672 0.80 LDHA (0.39) MEN1ESR1GAAKMT2AESR2
Trifluoromethanesulfonic Acid SCHEMBL3287537 0.80 PTGS1 (0.37) MEN1ESR1GAAKMT2AESR2
Trifluoromethanesulfonic Acid SCHEMBL29353026 0.80 PTGS1 (0.37) MEN1ESR1GAAKMT2AESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed