Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGLL | Q99685 | 2/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | ATM | Q13315 | 1/20 | 0.50 |
| ▸ | FAAH | O00519 | 1/20 | 0.46 |
| ▸ | MAOB | P27338 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.44 |
| ▸ | NAAA | Q02083 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1053903 | 1.00 | MGLL (0.53) | MGLLKMT2AMEN1LMNATP53 | |
| SCHEMBL6448999 | 1.00 | MGLL (0.53) | MGLLKMT2AMEN1LMNATP53 | |
| SCHEMBL10401227 | 1.00 | MGLL (0.53) | MGLLKMT2AMEN1LMNATP53 | |
| SCHEMBL29790025 | 0.94 | ALDH1A1 (0.47) | MGLLKMT2AMEN1LMNAMAOB | |
| SCHEMBL793834 | 0.94 | ALDH1A1 (0.47) | MGLLKMT2AMEN1LMNAMAOB | |
| SCHEMBL11964039 | 0.92 | ALDH1A1 (0.49) | KMT2AMEN1LMNAMAOBPOLB | |
| SCHEMBL1057908 | 0.90 | MAOB (0.49) | KMT2AMEN1MAOBPOLBCYP2C19 | |
| SCHEMBL13020973 | 0.90 | LMNA (0.53) | MGLLKMT2ALMNAMAOBPOLB | |
| SCHEMBL7745723 | 0.88 | KAT2B (0.45) | KMT2AMEN1MAOBPOLBCYP2C19 | |
| SCHEMBL6865424 | 0.87 | EPHX2 (0.44) | KMT2AMAOBPOLBCYP2C19ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8367190-B2 | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | LG CHEM, LTD. (KR) | 2013-02-05 | — | — | US | claimed |
| US-20100080973-A1 | LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2010-04-01 | — | — | US | claimed |
| WO-2008035890-A1 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2008-03-27 | — | — | WO | claimed |
| CN-108292094-B | Resist pattern forming method and resist material | 国立大学法人大阪大学 | 2021-07-20 | — | — | CN | disclosed |
| CN-112272798-A | Resist pattern forming method | 国立大学法人大阪大学 | 2021-01-26 | — | — | CN | disclosed |
| EP-3374467-B1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC TECH AG (CH) | 2020-04-15 | — | — | EP | disclosed |
| US-20180320072-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | Rolic Technologies AG (CH) | 2018-11-08 | — | — | US | disclosed |
| EP-3374467-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC Technologies AG (CH) | 2018-09-19 | — | — | EP | disclosed |
| WO-2017080977-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC AG (CH) | 2017-05-18 | — | — | WO | disclosed |
| US-8367190-B2 | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | LG CHEM, LTD. (KR) | 2013-02-05 | — | — | US | disclosed |
| US-20100080973-A1 | LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2010-04-01 | — | — | US | disclosed |
| EP-0816925-B1 | Ultraviolet-curable composition and method for curing or patterning | DOW CORNING ASIA LTD (JP) | 2001-09-26 | — | — | EP | disclosed |
| US-6096483-A | ULTRAVIOLET RADIATION BASE-GENERATING SUBSTANCE; SILOXANE POLYMER HAVING SILICON-HYDROGEN BONDS CAPABLE OF REACTING WITH HYDROXY GROUPS UNDER THE EFFECT OF THE BASE TO FORM SILICON-OXYGEN BONDS AND HYDROGEN; AND ACID; STORAGE STABLE | DOW CORNING ASIA, LTD. (JP) | 2000-08-01 | — | — | US | disclosed |
| EP-0725106-B1 | Radiation curable compositions | DOW CORNING ASIA LTD (JP) | 1999-11-03 | — | — | EP | disclosed |
| US-5891529-A | Radiation curable sompositions | DOW CORNING ASIA, LTD. (JP) | 1999-04-06 | — | — | US | disclosed |
| US-5861235-A | Ultraviolet-curable composition and method for patterning the cured product therefrom | DOW CORNING ASIA, LTD. (JP) | 1999-01-19 | — | — | US | disclosed |
| US-5789460-A | Radiation curable compositions | DOW CORNING ASIA, LTD. (JP) | 1998-08-04 | — | — | US | disclosed |
| EP-0816925-A1 | Ultraviolet-curable composition and method for curing or patterning | DOW CORNING ASIA, Ltd. (JP) | 1998-01-07 | — | — | EP | disclosed |
| EP-0798341-A1 | Radiation-curable composition and method for manufacturing cured-product patterns therefrom | DOW CORNING ASIA, Ltd. (JP) | 1997-10-01 | — | — | EP | disclosed |
| EP-0725106-A2 | Radiation curable compositions | DOW CORNING ASIA, Ltd. (JP) | 1996-08-07 | — | — | EP | disclosed |