Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KAT2B | Q92831 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | CTSD | P07339 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | SLC9A1 | P19634 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29362035 | 0.87 | MAOB (0.44) | KAT2BALDH1A1L3MBTL1CTSDNPSR1 | |
| SCHEMBL2201163 | 0.87 | ALDH1A1 (0.35) | ALDH1A1GPR35TDP1HTTLMNA | |
| SCHEMBL1130378 | 0.87 | MAOB (0.44) | KAT2BALDH1A1L3MBTL1CTSDNPSR1 | |
| SCHEMBL16924652 | 0.84 | GPR35 (0.39) | ALDH1A1CTSDNPSR1GPR35TDP1 | |
| SCHEMBL2201250 | 0.81 | MAPT (0.36) | KAT2BALDH1A1KDM4E | |
| SCHEMBL1056792 | 0.80 | KAT2B (0.40) | KAT2BALDH1A1L3MBTL1CTSDGPR35 | |
| SCHEMBL2200132 | 0.79 | CYP1A2 (0.45) | KAT2BALDH1A1GPR35TDP1KDM4E | |
| SCHEMBL1055261 | 0.79 | KAT2B (0.37) | KAT2BALDH1A1L3MBTL1CTSDNPSR1 | |
| SCHEMBL2200690 | 0.79 | RAB9A (0.46) | ALDH1A1MAOBHTT | |
| SCHEMBL16225602 | 0.78 | KAT2B (0.40) | KAT2BALDH1A1CTSDGPR35TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8367190-B2 | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | LG CHEM, LTD. (KR) | 2013-02-05 | — | — | US | claimed |
| US-20100080973-A1 | LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2010-04-01 | — | — | US | claimed |
| WO-2008035890-A1 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2008-03-27 | — | — | WO | claimed |
| EP-3161061-B1 | METHOD OF FORMING A PATTERNED THIN FILM COMPONENT AND ORGANIC THIN FILM TRANSISTOR | FLEXTERRA INC (US) | 2020-11-18 | — | — | EP | disclosed |
| EP-3374467-B1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC TECH AG (CH) | 2020-04-15 | — | — | EP | disclosed |
| CN-106663736-B | Photopatternable composition, patterned high dielectric thin film dielectric and related devices | 飞利斯有限公司 | 2020-01-17 | — | — | CN | disclosed |
| US-10409159-B2 | Photopatternable compositions, patterned high k thin film dielectrics and related devices | FLEXTERRA, INC. (US) | 2019-09-10 | — | — | US | disclosed |
| US-10162260-B2 | Photosensitive resin composition, protective film, and liquid crystal display element | CHI MEI CORPORATION (TW) | 2018-12-25 | — | — | US | disclosed |
| US-20180320072-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | Rolic Technologies AG (CH) | 2018-11-08 | — | — | US | disclosed |
| EP-3374467-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC Technologies AG (CH) | 2018-09-19 | — | — | EP | disclosed |
| US-20170192354-A1 | PHOTOPATTERNABLE COMPOSITIONS, PATTERNED HIGH K THIN FILM DIELECTRICS AND RELATED DEVICES | USINVEST LLC | 2017-07-06 | — | — | US | disclosed |
| US-8367190-B2 | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | LG CHEM, LTD. (KR) | 2013-02-05 | — | — | US | disclosed |
| US-20100080973-A1 | LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2010-04-01 | — | — | US | disclosed |
| WO-2008035890-A1 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2008-03-27 | — | — | WO | disclosed |
| US-6403499-B2 | FOR SEMICONDUCTORS | MICRON TECHNOLOGY, INC. | 2002-06-11 | — | — | US | disclosed |
| US-20010007798-A1 | Planarization of non-planar surfaces in device fabrication | MARSH EUGENE P (US) | 2001-07-12 | — | — | US | disclosed |
| US-6218316-B1 | Planarization of non-planar surfaces in device fabrication | MICRON TECHNOLOGY, INC. | 2001-04-17 | — | — | US | disclosed |
| US-5545509-A | INTEGRATED CIRCUITS; HIGH DENSITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-08-13 | — | — | US | disclosed |
| EP-0599571-B1 | Photoresist composition | IBM (US) | 1996-03-27 | — | — | EP | disclosed |
| EP-0599571-A2 | Photoresist composition | International Business Machines Corporation (US) | 1994-06-01 | — | — | EP | disclosed |