Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 2/20 | 0.47 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.43 |
| ▸ | CA9 | Q16790 | 4/20 | 0.39 |
| ▸ | CA12 | O43570 | 3/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.37 |
| ▸ | CDK1 | P06493 | 1/20 | 0.37 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.37 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.37 |
| ▸ | CDK2 | P24941 | 1/20 | 0.37 |
| ▸ | CDK7 | P50613 | 1/20 | 0.37 |
| ▸ | CCNH | P51946 | 1/20 | 0.37 |
| ▸ | CCNA1 | P78396 | 1/20 | 0.37 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.37 |
| ▸ | CA5A | P35218 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 4/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL1088679 | 1.00 | GPR3 (0.47) | GPR3KCNH2CA9CA12CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL36224 | 0.93 | GPR3 (0.44) | GPR3KCNH2CA9CA12CA1 | |
| SCHEMBL30161534 | 0.92 | GPR3 (0.39) | GPR3KCNH2CA9CA12CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6118365 | 0.91 | GPR3 (0.48) | GPR3KCNH2CA9CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL2324715 | 0.90 | KCNH2 (0.43) | GPR3KCNH2HTTSMN1; SMN2GAA | |
| Trifluoromethanesulfonic Acid SCHEMBL31720833 | 0.90 | KCNH2 (0.43) | GPR3KCNH2HTTSMN1; SMN2GAA | |
| Trifluoromethanesulfonic Acid SCHEMBL31155703 | 0.89 | GPR3 (0.50) | GPR3KCNH2CA9CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL37032 | 0.89 | GPR3 (0.50) | GPR3KCNH2CA9CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL10008137 | 0.87 | GPR3 (0.48) | GPR3KCNH2CA9CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL9135540 | 0.86 | ACHE (0.45) | GPR3KCNH2CA9CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1509 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12187851-B2 | Network polymers and methods of making and using same | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2025-01-07 | — | — | US | claimed |
| CN-118915389-A | High-resolution negative photoresist and preparation method and application thereof | 盐城艾肯科技有限公司 | 2024-11-08 | — | — | CN | claimed |
| US-20230119934-A1 | NETWORK POLYMERS AND METHODS OF MAKING AND USING SAME | UNIV COLORADO REGENTS (US) | 2023-04-20 | — | — | US | claimed |
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| US-11535713-B2 | Network polymers and methods of making and using same | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2022-12-27 | — | — | US | claimed |
| CN-115368494-A | Hexafluoroisopropanol-containing monomer copolymer, preparation method thereof, chemical amplification type photoresist and application | 瑞红(苏州)电子化学品股份有限公司 | 2022-11-22 | — | — | CN | claimed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| EP-3883745-A1 | PRECISION SYSTEM FOR ADDITIVE FABRICATION | Inkbit, LLC (US) | 2021-09-29 | — | — | EP | claimed |
| US-20020164541-A1 | Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same | HYNIX SEMICONDUCTOR, INC. (KR) | 2002-11-07 | — | — | US | claimed |
| US-20020160301-A1 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-10-31 | — | — | US | claimed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | claimed |
| US-6153349-A | COMPRISING POLYVINYLPHENOL DERIVATIVE RESIN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-11-28 | — | — | US | claimed |
| US-6063542-A | Polymer for positive photoresist and chemical amplification positive photoresist composition comprising the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2000-05-16 | — | — | US | claimed |
| EP-0955563-A1 | A photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-11-10 | — | — | EP | claimed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | claimed |
| US-5962185-A | Polymer for positive photoresist and chemical amplified positive photoresist composition containing the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 1999-10-05 | — | — | US | claimed |
| US-5962186-A | Polymer for chemical amplified positive photoresist composition containing the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 1999-10-05 | — | — | US | claimed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | claimed |