Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 2/20 | 0.44 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.43 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | CA1 | P00915 | 3/20 | 0.41 |
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | CA5A | P35218 | 2/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA3 | P07451 | 1/20 | 0.39 |
| ▸ | CA6 | P23280 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.39 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.39 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.38 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.37 |
| ▸ | CDK1 | P06493 | 1/20 | 0.37 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.37 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.37 |
| ▸ | CDK2 | P24941 | 1/20 | 0.37 |
| ▸ | CDK7 | P50613 | 1/20 | 0.37 |
| ▸ | CCNH | P51946 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL36147 | 0.93 | GPR3 (0.47) | GPR3KCNH2GAACA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL1088679 | 0.93 | GPR3 (0.47) | GPR3KCNH2GAACA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL9135540 | 0.93 | ACHE (0.45) | GPR3KCNH2GAACA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL8374961 | 0.91 | LMNA (0.41) | GPR3KCNH2GAACA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL8862176 | 0.91 | ACHE (0.43) | GPR3KCNH2GAACA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL5433012 | 0.90 | SMN1; SMN2 (0.46) | GPR3KCNH2CA1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL2901812 | 0.88 | ACHE (0.47) | KCNH2FFAR4ALDH1A1CYP3A4CYP2C9 | |
| Trifluoromethanesulfonic Acid SCHEMBL7038099 | 0.87 | GPR3 (0.37) | GPR3KCNH2GAACA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL562050 | 0.86 | GPR3 (0.43) | GPR3KCNH2GAACA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL8862157 | 0.86 | BCHE (0.40) | GPR3KCNH2GAACA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 857 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115561966-A | Chemical amplification type negative photosensitive polyimide coating adhesive and application | 明士(北京)新材料开发有限公司 | 2023-01-03 | — | — | CN | claimed |
| CN-114874441-B | Chemical amplification type positive photosensitive polyimide coating adhesive and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-115124928-A | OCA optical glue for curved surface screen, adhesive film and preparation method thereof | 浙江日久新材料科技有限公司 | 2022-09-30 | — | — | CN | claimed |
| CN-114874441-A | Chemical amplification type positive photosensitive polyimide coating adhesive and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-08-09 | — | — | CN | claimed |
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| CN-114488690-A | Chemical amplification type negative polyimide photoresist and preparation method and application thereof | 中国科学院化学研究所 | 2022-05-13 | — | — | CN | claimed |
| CN-114456371-A | Esterified monomer, low-drainage-type polycarboxylate superplasticizer suitable for machine-made sand and preparation method of polycarboxylate superplasticizer | 厦门市建筑科学研究院有限公司 | 2022-05-10 | — | — | CN | claimed |
| US-8053158-B2 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-11-08 | — | — | US | claimed |
| US-20070202436-A1 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-30 | — | — | US | claimed |
| US-6033826-A | POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2000-03-07 | — | — | US | claimed |
| US-20260132299-A1 | COATED ZIRCONIUM NITRIDE PARTICLE AND UV-CURABLE BLACK ORGANIC COMPOSITION | MITSUBISHI MATERIALS CORPORATION (JP) | 2026-05-14 | — | — | US | disclosed |
| US-20260117026-A1 | DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES | MERCK PATENT GMBH (DE) | 2026-04-30 | — | — | US | disclosed |
| US-12613133-B2 | Inspection tool and inspection method | FUJIFILM CORPORATION (JP) | 2026-04-28 | — | — | US | disclosed |
| US-20260098128-A1 | CURABLE BRANCHED ORGANOPOLYSILOXANE, HIGH ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME, AND USE THEREOF | DOW TORAY CO LTD (JP) | 2026-04-09 | — | — | US | disclosed |
| EP-4714990-A1 | COPOLYMER, POLYMER FOR WATER-REPELLENT AGENT, COMPOSITION FOR FORMING WATER-REPELLENT FILM, RESIN FILM, AND METHOD FOR FORMING RESIST PATTERN | Central Glass Company, Limited (JP) | 2026-03-25 | — | — | EP | disclosed |
| EP-0679951-B1 | Positive resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| EP-0679951-A1 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-11-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260132299-A1 | COATED ZIRCONIUM NITRIDE PARTICLE AND UV-CURABLE BLACK ORGANIC COMPOSITION | NOP56, TYR, MITF | GPR3 3854/4885KCNH2 357/4885GAA 1922/4885 |
| US-12613133-B2 | Inspection tool and inspection method | TAS2R30, TAS2R60, TAS2R39 | GPR3 4015/4885KCNH2 4290/4885GAA 4285/4885 |
| US-20260098128-A1 | CURABLE BRANCHED ORGANOPOLYSILOXANE, HIGH ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME, AND USE THEREOF | COL2A1, COL1A1, SEM1 | GPR3 2337/4885KCNH2 2681/4885GAA 563/4885 |
| US-20260117026-A1 | DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES | KCNE1, GLRB, PBRM1 | GPR3 1715/4885KCNH2 76/4885GAA 3899/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.