Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 2/20 | 0.50 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CA5A | P35218 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 8/20 | 0.36 |
| ▸ | ACHE | P22303 | 5/20 | 0.36 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL9279810 | 0.94 | GPR3 (0.46) | GPR3PTPN1CA1CA2CA5A | |
| Trifluoromethanesulfonic Acid SCHEMBL503264 | 0.91 | GPR3 (0.43) | GPR3PTPN1ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL30407359 | 0.91 | GPR3 (0.43) | GPR3PTPN1CA1CA2CA5A | |
| Trifluoromethanesulfonic Acid SCHEMBL8735160 | 0.89 | GPR3 (0.42) | GPR3PTPN1CA1CA2CA5A | |
| Trifluoromethanesulfonic Acid SCHEMBL2851342 | 0.89 | GPR3 (0.47) | GPR3CA1CA2CA5ACA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL3147966 | 0.89 | GPR3 (0.42) | GPR3PTPN1CA1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL8735181 | 0.89 | GPR3 (0.42) | GPR3PTPN1CA1CA2CA5A | |
| Tert-Butylbenzene SCHEMBL2964334 | 0.88 | GPR3 (0.41) | GPR3PTPN1CA1CA2CA5A | |
| Trifluoromethanesulfonic Acid SCHEMBL1002309 | 0.86 | HSD11B1 (0.41) | GPR3PTPN1CA1CA2ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL12613417 | 0.86 | GPR3 (0.40) | GPR3PTPN1CA1CA2RIPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 6615 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| WO-2026107261-A1 | PURIFICATION OF PHOTORESIST POLYMER BY SURFACE-MODIFIED POROUS POLYETHYLENE MEMBRANE | ENTEGRIS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| CN-122043865-A | High-resolution photoresist composition and preparation method thereof | 西安尤尼亢新材料有限公司 | 2026-05-15 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| EP-4719411-A2 | QUINOLINEAMINE AND PYRIDOQUINOLINE ANTIDEGRADANT COMPOUNDS AND USES THEREOF | Flexsys IP Holdings, LLC (US) | 2026-04-08 | — | — | EP | claimed |
| EP-4704835-A2 | ANTIDEGRADANT BIS(DIHYDRO AND TETRAHYDROQUINOLINE) COMPOUNDS AND USES THEREOF | Flexsys IP Holdings, LLC (US) | 2026-03-11 | — | — | EP | claimed |
| EP-4687882-A2 | 6-AMINOQUINOLINE ANTIDEGRADANTS | Flexsys IP Holdings, LLC (US) | 2026-02-11 | — | — | EP | claimed |
| EP-4687881-A2 | HETEROARYL ANTIDEGRADANTS | Flexsys IP Holdings, LLC (US) | 2026-02-11 | — | — | EP | claimed |
| EP-4676471-A2 | QUINOLINEIMINE ANTIDEGRADANT COMPOUNDS AND USES THEREOF | Flexsys IP Holdings, LLC (US) | 2026-01-14 | — | — | EP | claimed |
| US-20250383599-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND RESOLUTION | YCCHEM CO LTD (KR) | 2025-12-18 | — | — | US | claimed |
| US-5322765-A | Dry developable photoresist compositions and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-06-21 | — | — | US | claimed |
| EP-0234327-B1 | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORP (US) | 1994-04-13 | — | — | EP | claimed |
| EP-0543762-A1 | Dry developable photoresist compositions and method for use thereof | International Business Machines Corporation (US) | 1993-05-26 | — | — | EP | claimed |
| EP-0453126-A2 | Negative photoresist developable in aqueous base | HOECHST CELANESE CORPORATION (US) | 1991-10-23 | — | — | EP | claimed |
| EP-0410794-A2 | Maleimide containing, negative working deep UV photoresist | HOECHST CELANESE CORPORATION (US) | 1991-01-30 | — | — | EP | claimed |
| US-4968581-A | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-11-06 | — | — | US | claimed |
| US-4912018-A | High resolution photoresist based on imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-03-27 | — | — | US | claimed |
| US-4837124-A | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1989-06-06 | — | — | US | claimed |
| US-4775609-A | Image reversal | HOESCHT CELANESE CORPORATION (US) | 1988-10-04 | — | — | US | claimed |
| EP-0234327-A2 | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1987-09-02 | — | — | EP | claimed |