Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 2/20 | 0.41 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.41 |
| ▸ | HSD11B1 | P28845 | 5/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.38 |
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | CA5A | P35218 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.38 |
| ▸ | UQCRB | P14927 | 1/20 | 0.38 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | NR3C2 | P08235 | 1/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | RECQL | P46063 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL1002309 | 0.95 | HSD11B1 (0.41) | GPR3PTPN1HSD11B1ALDH1A1CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1270048 | 0.95 | HSD11B1 (0.41) | GPR3PTPN1HSD11B1ALDH1A1CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL36627 | 0.88 | ALDH1A1 (0.46) | GPR3HSD11B1ALDH1A1CA1CA2 | |
| Biphenyl SCHEMBL1360704 | 0.88 | PTPN1 (0.43) | GPR3PTPN1HSD11B1ALDH1A1HSD17B3 | |
| Trifluoromethanesulfonic Acid SCHEMBL36177 | 0.88 | GPR3 (0.50) | GPR3PTPN1HSD11B1ALDH1A1CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL9279810 | 0.82 | GPR3 (0.46) | GPR3PTPN1HSD11B1ALDH1A1CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1002308 | 0.82 | HSD11B1 (0.40) | PTPN1HSD11B1ALDH1A1CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL1051928 | 0.81 | HSD11B1 (0.39) | GPR3PTPN1HSD11B1ALDH1A1ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL2851342 | 0.81 | GPR3 (0.47) | GPR3ALDH1A1CA1CA2CA5A | |
| SCHEMBL7708260 | 0.81 | HSD11B1 (0.38) | HSD11B1ALDH1A1CA1CA2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7670745-B2 | Alkali soluble polymer and positive working photosensitive resin composition using the same | CHISSO CORPORATION (JP) | 2010-03-02 | — | — | US | disclosed |
| US-20080131813-A1 | Alkali soluble polymer and positive working photosensitive resin composition using the same | CHISSO CORPORATION | 2008-06-05 | — | — | US | disclosed |
| US-6340552-B1 | AS PHOTORESISTS IN MANUFACTURING SEMICONDUCTORS | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-01-22 | — | — | US | disclosed |
| US-6306553-B1 | PHOTOSENSITIVE COMPOSITION COMPRISING ALKALI-SOLUBLE POLYMER, COMPOUND GENERATING ACID WHEN EXPOSED TO CHEMICAL RADIATION, COMPOUND HAVING SUBSTITUENT DECOMPOSED BY REACTION WITH ACID GENERATED AND GROUP CONVERTED TO ACID BY REACTION WITH ALKALI | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-23 | — | — | US | disclosed |
| US-6168897-B1 | PATTERNWISE-EXPOSING THE LAMINATED LAYER COMPRISING LIGHT SENSITIVE LAYER AND FLUORESCENT LIGHT-GENERATING LAYER TO ELECTROMAGNETIC RADIATION AND AN ELECTRON BEAM TO GENERATE A FLUORESCENT LIGHT CAUSING PHOTOCHEMICAL REACTION, DEVELOPING | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-01-02 | — | — | US | disclosed |
| US-5928841-A | Method of photoetching at 180 to 220 | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-07-27 | — | — | US | disclosed |
| US-RE35821-E | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-06-09 | — | — | US | disclosed |
| US-5332648-A | Alklali soluble phenolic polymer, cyclic ester or sulfonate which converts to the acid, an onium salt which generates an an acid on exposure to radiation | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-07-26 | — | — | US | disclosed |
| US-5326675-A | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-07-05 | — | — | US | disclosed |
| US-5091282-A | Comprising a 4-oxo-p-dioxin or a C5-6 carbcyclic fused derivative and a phenolic resin or a hydroxyl-containing polysiloxane or -silane; photoresists using short wavelengths of UV; sharpness | KABUSHIKI KAISHA TOSHIBA (JP) | 1992-02-25 | — | — | US | disclosed |
| EP-0396254-A2 | Photosensitive composition and pattern formation method using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-11-07 | — | — | EP | disclosed |