SCHEMBL3623593

SCHEMBL3623593

[CH2]C(C)N(CCCC)CCCC

nearest known ligand 0.33

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 1/20 0.33
MMP2 P08253 1/20 0.33
MMP3 P08254 1/20 0.33
MMP8 P22894 1/20 0.33
DNM1 Q05193 3/20 0.32
TSHR P16473 2/20 0.32
LMNA P02545 1/20 0.32
ALDH1A1 P00352 1/20 0.31
ALDH2 P05091 1/20 0.31
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA9 Q16790 1/20 0.31
OPRM1 P35372 1/20 0.31
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1977488 0.82 FDPS (0.39)
SCHEMBL22188630 0.80 MMP1 (0.34) MMP1MMP2MMP3MMP8DNM1
SCHEMBL10583794 0.77 MMP1 (0.36) MMP1MMP2MMP3MMP8DNM1
SCHEMBL865548 0.77 MMP1 (0.36) MMP1MMP2MMP3MMP8DNM1
SCHEMBL28758676 0.76 MMP1 (0.37) MMP1MMP2MMP3MMP8DNM1
SCHEMBL10722168 0.76 MMP1 (0.32) MMP1MMP2MMP3MMP8DNM1
SCHEMBL11873716 0.76 MMP1 (0.32) MMP1MMP2MMP3MMP8DNM1
Hydrochloric Acid SCHEMBL1428262 0.74 DNM1 (0.38) MMP1MMP2MMP3MMP8DNM1
Bromide SCHEMBL31364322 0.74 DNM1 (0.38) MMP1MMP2MMP3MMP8DNM1
Water SCHEMBL28587222 0.74 TSHR (0.35) MMP1MMP2MMP3MMP8DNM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4405426-A Self-curing irradiated blend of epoxy resin and salt of quaternary amino ester of unsaturated acid JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1983-09-20 US claimed
WO-2019162308-A1 BENZAMIDE COMPOUNDS AND THEIR USE AS HERBICIDES BASF SE (DE) 2019-08-29 WO disclosed
WO-2019162309-A1 BENZAMIDE COMPOUNDS AND THEIR USE AS HERBICIDES BASF SE (DE) 2019-08-29 WO disclosed
WO-2019016385-A1 BENZAMIDE COMPOUNDS AND THEIR USE AS HERBICIDES BASF SE (DE) 2019-01-24 WO disclosed
WO-2018234371-A1 BENZAMIDE COMPOUNDS AND THEIR USE AS HERBICIDES BASF SE (DE) 2018-12-27 WO disclosed
US-20100068486-A1 AUTOMOBILE WINDOW MATERIAL, AUTOMOBILE, ANTIFOG TREATMENT COATING LIQUID AND ANTIFOG ARTICLE NIPPON SHEET GLASS CO., LTD. (JP) 2010-03-18 US disclosed
EP-2123448-A1 AUTOMOBILE WINDOW MATERIAL, AUTOMOBILE, ANTIFOG TREATMENT COATING LIQUID AND ANTIFOG ARTICLE Nippon Sheet Glass Co., Ltd. (JP) 2009-11-25 EP disclosed
EP-1862514-A1 COATING SOLUTION FOR ANTI-FOGGING TREATMENT AND FOG-RESISTANT PRODUCT SDC Technologies-Asia Ltd. (JP) 2007-12-05 EP disclosed
US-4642266-A SCRATCH RESISTANCE AND WEATHERABILITY NIPPON SHEET GLASS CO., LTD. (JP) 1987-02-10 US disclosed
US-RE32272-E EPOXY GROUP-CONTAINING SILANE COMPOUND, POLYHDRIC ALCOHOL, POLYMER AND CURING AGENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1986-10-28 US disclosed
US-4594379-A Containing an organosilicon compound in photoinitiator blend NIPPON SHEET GLASS CO., LTD. (JP) 1986-06-10 US disclosed
US-4522966-A CURABLE MIXTURE OF GLYCIDYL-CONTAINING ACRYLIC POLYMER, A POLYOXYALKYLENE GLYCOL AND CATALYST NIPPON SHEET GLASS CO., LTD. (JP) 1985-06-11 US disclosed
US-4405426-A Self-curing irradiated blend of epoxy resin and salt of quaternary amino ester of unsaturated acid JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1983-09-20 US disclosed