SCHEMBL3624969

SCHEMBL3624969

CC(C)(S(=O)(=O)O)S(=O)(=O)O

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CA5A P35218 2/20 0.39
CA5B Q9Y2D0 2/20 0.39
TSHR P16473 3/20 0.33
ALDH1A1 P00352 2/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
NT5E P21589 1/20 0.33
CA4 P22748 1/20 0.33
CA6 P23280 1/20 0.33
CA7 P43166 1/20 0.33
CA9 Q16790 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29170922 1.00 CA5A (0.39) CA5ACA5BTSHRALDH1A1CA1
SCHEMBL16756644 0.96 CA5A (0.36) CA5ACA5BTSHRALDH1A1CA1
SCHEMBL14974349 0.96 CA5A (0.36) CA5ACA5BTSHRALDH1A1CA1
SCHEMBL10784905 0.82 KDM4E (0.31) CA5ACA5BCA2
SCHEMBL10626561 0.79
SCHEMBL28948153 0.79 CA1 (0.41) CA5ACA5BTSHRCA1CA2
SCHEMBL28624 0.78
SCHEMBL23883899 0.75
Ammonia Solution, Strong SCHEMBL25242349 0.75
SCHEMBL270854 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025070770-A1 COMPOUND HAVING OXAZOLIDINE STRUCTURE, NONAQUEOUS ELECTROLYTE CONTAINING SAID COMPOUND, AND NONAQUEOUS ELECTROLYTE BATTERY CONTAINING SAID NONAQUEOUS ELECTROLYTE セントラル硝子株式会社 2025-04-03 WO claimed
CN-113299990-B Lithium ion battery electrolyte and lithium ion battery 张家港市国泰华荣化工新材料有限公司 2022-07-01 CN claimed
EP-3093914-B1 METHOD FOR PRODUCING NONAQUEOUS ELECTROLYTE SECONDARY CELL NISSAN MOTOR (JP) 2018-10-17 EP claimed
EP-2011791-B1 PROCESS FOR PRODUCTION OF METHYLENE DISULFONATE COMPOUND SUMITOMO SEIKA CHEMICALS (JP) 2012-06-27 EP claimed
WO-2025070769-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY USING SAME セントラル硝子株式会社 2025-04-03 WO disclosed
WO-2025070770-A1 COMPOUND HAVING OXAZOLIDINE STRUCTURE, NONAQUEOUS ELECTROLYTE CONTAINING SAID COMPOUND, AND NONAQUEOUS ELECTROLYTE BATTERY CONTAINING SAID NONAQUEOUS ELECTROLYTE セントラル硝子株式会社 2025-04-03 WO disclosed
WO-2025047678-A1 NON-AQUEOUS ELECTROLYTE AND NON-AQUEOUS ELECTROLYTE BATTERY セントラル硝子株式会社 2025-03-06 WO disclosed
US-12215091-B2 Method for producing methylene disulfonate compound SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2025-02-04 US disclosed
WO-2024253162-A1 ELECTROLYTE SOLUTION FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY CONTAINING SAME セントラル硝子株式会社 2024-12-12 WO disclosed
US-12129239-B2 Method for producing methylene disulfonate compound SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2024-10-29 US disclosed
EP-4006020-B1 METHOD FOR PRODUCING CYCLIC DISULFONIC ACID ESTER COMPOUND SUMITOMO SEIKA CHEMICALS (JP) 2024-09-25 EP disclosed
CN-114243203-B High-elongation diaphragm, preparation method thereof and lithium ion battery 远景动力技术(江苏)有限公司 2024-06-21 CN disclosed
EP-1314552-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2003-05-28 EP disclosed
EP-0949539-B1 Photosensitive resin composition FUJI PHOTO FILM CO LTD (JP) 2003-03-19 EP disclosed
CN-1388009-A Supporting body for lithographic printing plate and lithographic printing plate originals FUJI PHOTO FILM CO LTD (JP) 2003-01-01 CN disclosed
EP-1225478-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2002-07-24 EP disclosed
US-6423467-B1 USEFUL IN A LITHOGRAPHIC PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 2002-07-23 US disclosed
US-20020086233-A1 Useful in a lithographic printing plates FUJIFILM CORPORATION (JP) 2002-07-04 US disclosed
US-20020051929-A1 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life FUJIFILM CORPORATION (JP) 2002-05-02 US disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12129239-B2 Method for producing methylene disulfonate compound TST, MPST, SQOR CA5A 1410/4885CA5B 886/4885TSHR 3410/4885
US-12215091-B2 Method for producing methylene disulfonate compound TST, MPST, STS CA5A 1299/4885CA5B 630/4885TSHR 3838/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.