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SCHEMBL3645926

SCHEMBL3645926

Cc1cc(O)cc(C)c1C(C)(c1ccc(C(C)(C)c2ccc(O)cc2)cc1)c1c(C)cc(O)cc1C

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 11/20 0.59
▸ ESR2 Q92731 10/20 0.59
▸ CYP3A4 P08684 2/20 0.59
▸ ESRRG P62508 2/20 0.59
▸ AR P10275 1/20 0.59
▸ HPGD P15428 1/20 0.59
▸ TSHR P16473 1/20 0.59
▸ SLC6A2 P23975 1/20 0.59
▸ SLC6A4 P31645 1/20 0.59
▸ HTR6 P50406 1/20 0.59
▸ SLC6A3 Q01959 1/20 0.59
▸ HSD17B10 Q99714 1/20 0.59
▸ ALDH1A1 P00352 1/20 0.52
▸ LMNA P02545 1/20 0.43
▸ TYR P14679 1/20 0.43
▸ MEN1 O00255 2/20 0.40
▸ KMT2A Q03164 2/20 0.40
▸ SHBG P04278 1/20 0.37
▸ HSP90AA1 P07900 1/20 0.36
▸ ATM Q13315 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10903152 0.86 ESR1 (0.60) ESR1ESR2CYP3A4ESRRGAR
SCHEMBL5674802 0.84 MEN1 (0.47) ESR1ESR2CYP3A4ESRRGAR
SCHEMBL9652181 0.81 ESR1 (0.50) ESR1ESR2CYP3A4ESRRGAR
SCHEMBL8733583 0.80 GABRA1 (0.48) ESR1ESR2CYP3A4ESRRGAR
SCHEMBL35973 0.80 ESR1 (0.84) ESR1ESR2CYP3A4ESRRGAR
SCHEMBL3649814 0.79 ESR1 (0.61) ESR1ESR2CYP3A4ESRRGAR
SCHEMBL3681031 0.78 ESR1 (0.73) ESR1ESR2CYP3A4ESRRGAR
SCHEMBL3646850 0.78 ESR1 (0.68) ESR1ESR2CYP3A4ESRRGAR
SCHEMBL20198395 0.78 ESR1 (0.68) ESR1ESR2CYP3A4ESRRGAR
Bisphenol A SCHEMBL9774987 0.77 ESR1 (1.00) ESR1ESR2CYP3A4ESRRGAR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 — — EP claimed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 — — WO claimed
US-20040197696-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 — — US claimed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 — — US claimed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 — — US claimed
EP-0443820-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-08-28 — — EP claimed
EP-2183292-A2 ANTIREFLECTIVE COATING COMPOSITION AZ Electronic Materials USA Corp. (US) 2010-05-12 — — EP disclosed
WO-2009022224-A2 ANTIREFLECTIVE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA CORP. (DE) 2009-02-19 — — WO disclosed
US-20090042133-A1 Antireflective Coating Composition AZ ELECTRONIC MATERIALS USA CORP. 2009-02-12 — — US disclosed
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 — — EP disclosed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 — — WO disclosed
US-20040197696-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 — — US disclosed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 — — US disclosed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 — — US disclosed
EP-0443820-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-08-28 — — EP disclosed