SCHEMBL8733583

SCHEMBL8733583

Cc1cc(O)cc(C)c1C(C)(c1cc(C(C)(c2c(C)cc(O)cc2C)c2c(C)cc(O)cc2C)cc(C(C)(c2c(C)cc(O)cc2C)c2c(C)cc(O)cc2C)c1)c1c(C)cc(O)cc1C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 1/20 0.48
GABRB2 P47870 1/20 0.48
CYP3A4 P08684 4/20 0.42
CHRM1 P11229 1/20 0.42
ALOX15 P16050 1/20 0.42
MAOA P21397 1/20 0.42
TBXA2R P21731 1/20 0.42
ADRA1A P35348 1/20 0.42
HTR2B P41595 1/20 0.42
MEN1 O00255 1/20 0.39
HSP90AA1 P07900 1/20 0.39
KMT2A Q03164 1/20 0.39
ATM Q13315 1/20 0.39
ESR1 P03372 8/20 0.37
ALDH1A1 P00352 1/20 0.36
ESR2 Q92731 7/20 0.35
ACHE P22303 2/20 0.34
AR P10275 2/20 0.32
LMNA P02545 1/20 0.32
TYR P14679 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3645926 0.80 ESR1 (0.59) GABRA1GABRB2CYP3A4MEN1HSP90AA1
SCHEMBL2886053 0.77 CYP3A4 (0.48) GABRA1GABRB2CYP3A4CHRM1ALOX15
SCHEMBL10256491 0.77 ALOX15 (0.48) GABRA1GABRB2CYP3A4CHRM1ALOX15
SCHEMBL5674802 0.76 MEN1 (0.47) CYP3A4MEN1KMT2AESR1ESR2
SCHEMBL8407830 0.72 CA2 (0.52) GABRA1GABRB2CYP3A4ALOX15MEN1
SCHEMBL12149771 0.71 CYP3A4 (0.43) GABRA1GABRB2CYP3A4CHRM1ALOX15
SCHEMBL10903152 0.71 ESR1 (0.60) GABRA1GABRB2CYP3A4CHRM1ALOX15
SCHEMBL27779844 0.70 CYP3A4 (0.46) GABRA1GABRB2CYP3A4CHRM1ALOX15
SCHEMBL9652181 0.70 ESR1 (0.50) CYP3A4MEN1KMT2AESR1ALDH1A1
SCHEMBL23387403 0.70 ALOX15 (0.45) GABRA1GABRB2CYP3A4CHRM1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0555861-B1 Positive photoresist composition FUJI PHOTO FILM CO LTD (JP) 1998-11-11 EP disclosed
US-5340688-A Containing mixture of 1,2-naphthoquinonediazidosulfonate esters of polyhydroxy compounds and alkali soluble resin FUJI PHOTO FILM CO., LTD. (JP) 1994-08-23 US disclosed
US-5318875-A Resolution; heat resistance; photosensitivity; developability; integrated circuits; semiconductors FUJI PHOTO FILM CO., LTD. (JP) 1994-06-07 US disclosed
EP-0555861-A1 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1993-08-18 EP disclosed