SCHEMBL5674802

SCHEMBL5674802

Cc1cc(O)cc(C)c1C(C)(c1ccc(Cc2ccc(O)cc2)cc1)c1c(C)cc(O)cc1C

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
ESR1 P03372 12/20 0.47
ESR2 Q92731 11/20 0.47
ESRRG P62508 2/20 0.39
LMNA P02545 1/20 0.39
TYR P14679 1/20 0.39
CYP3A4 P08684 1/20 0.39
AR P10275 1/20 0.39
HPGD P15428 1/20 0.39
TSHR P16473 1/20 0.39
SLC6A2 P23975 1/20 0.39
SLC6A4 P31645 1/20 0.39
HTR6 P50406 1/20 0.39
SLC6A3 Q01959 1/20 0.39
HSD17B10 Q99714 1/20 0.39
ESRRB O95718 1/20 0.38
SHBG P04278 1/20 0.38
THRA P10827 1/20 0.36
THRB P10828 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3645926 0.84 ESR1 (0.59) MEN1KMT2AESR1ESR2ESRRG
SCHEMBL3655939 0.82 MEN1 (0.46) MEN1KMT2AESR1ESR2ESRRG
SCHEMBL3649608 0.82 MEN1 (0.66) MEN1KMT2AESR1ESR2ESRRG
SCHEMBL3642312 0.81 MEN1 (0.53) MEN1KMT2AESR1ESR2ESRRG
SCHEMBL6860005 0.81 ESR1 (0.59) MEN1KMT2AESR1ESR2CYP3A4
SCHEMBL3645152 0.80 ESR1 (0.62) MEN1KMT2AESR1ESR2ESRRG
SCHEMBL25805280 0.79 MEN1 (0.58) MEN1KMT2AESR1ESR2ESRRG
SCHEMBL9652181 0.77 ESR1 (0.50) MEN1KMT2AESR1ESR2ESRRG
SCHEMBL8733583 0.76 GABRA1 (0.48) MEN1KMT2AESR1ESR2ESRRG
SCHEMBL7774227 0.75 ESR1 (0.77) MEN1KMT2AESR1ESR2ESRRG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 EP claimed
EP-1614005-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-01-11 EP claimed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
WO-2004088424-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
US-20040197696-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US claimed
EP-0443820-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-08-28 EP claimed
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 EP disclosed
EP-1614005-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-01-11 EP disclosed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO disclosed
WO-2004088424-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO disclosed
US-20040197696-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US disclosed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US disclosed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US disclosed
EP-0443820-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-08-28 EP disclosed