SCHEMBL3658136

SCHEMBL3658136

CCC(=O)c1ccccc1C(C(=O)CC)(c1ccccc1)c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 4/20 0.43
DRD3 P35462 2/20 0.43
DRD2 P14416 1/20 0.43
GRIN2D O15399 2/20 0.40
GRIN1 Q05586 2/20 0.40
GRIN2A Q12879 2/20 0.40
GRIN2B Q13224 2/20 0.40
GRIN2C Q14957 2/20 0.40
OPRD1 P41143 2/20 0.40
CACNA1F O60840 1/20 0.40
ABCB1 P08183 1/20 0.40
CYP2B6 P20813 1/20 0.40
DRD4 P21917 1/20 0.40
OPRK1 P41145 1/20 0.40
CACNA1D Q01668 1/20 0.40
KCNH2 Q12809 1/20 0.40
CACNA1S Q13698 1/20 0.40
CACNA1C Q13936 1/20 0.40
MRGPRX2 Q96LB1 1/20 0.40
KCNN4 O15554 4/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13828216 0.80 OPRM1 (0.55) OPRM1DRD3DRD2GRIN2DGRIN1
SCHEMBL11297486 0.75 ALDH1A1 (0.43) ABCB1KMT2AL3MBTL1MAPTSMN1; SMN2
SCHEMBL27325599 0.74 PDK2 (0.41) ABCB1KMT2AL3MBTL1MAPTSMN1; SMN2
SCHEMBL28523326 0.74 PDK2 (0.41) ABCB1KMT2AL3MBTL1MAPTSMN1; SMN2
SCHEMBL1950901 0.74 CTNNB1 (0.57) PDK2CTNNB1WNT3A
SCHEMBL29410857 0.74 CTNNB1 (0.57) PDK2CTNNB1WNT3A
Hydrochloric Acid SCHEMBL5819908 0.73 CTNNB1 (0.55) PDK2CTNNB1WNT3A
SCHEMBL13990159 0.72 L3MBTL1 (0.52) ABCB1KMT2AL3MBTL1MAPTSMN1; SMN2
SCHEMBL12883298 0.71 HDAC3 (0.53) OPRM1DRD3DRD2GRIN2DGRIN1
SCHEMBL3652164 0.69 KCNN4 (0.44) KCNN4KMT2AMAPTSMN1; SMN2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2203783-A2 THICK FILM RESISTS AZ Electronic Materials USA Corp. (US) 2010-07-07 EP claimed
WO-2009040661-A2 THICK FILM RESISTS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2009-04-02 WO claimed
WO-2013064892-A2 NANOCOMPOSITE POSITIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF AZ ELECTRONICS MATERIALS USA CORP. (US) 2013-05-10 WO disclosed
US-20130108956-A1 NANOCOMPOSITE POSITIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-05-02 US disclosed
EP-2203783-A2 THICK FILM RESISTS AZ Electronic Materials USA Corp. (US) 2010-07-07 EP disclosed
WO-2009040661-A2 THICK FILM RESISTS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2009-04-02 WO disclosed
EP-1913444-A2 PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS AZ Electronic Materials USA Corp. (US) 2008-04-23 EP disclosed
EP-1877865-A2 NANOCOMPOSITE PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS AZ Electronic Materials USA Corp. (US) 2008-01-16 EP disclosed
WO-2007007176-A2 PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2007-01-18 WO disclosed
WO-2006109185-A2 NANOCOMPOSITE PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2006-10-19 WO disclosed
EP-1609025-A2 PHOTORESIST COMPOSITION FOR THE FORMATION OF THICK FILMS AZ Electronic Materials USA Corp. (US) 2005-12-28 EP disclosed
WO-2004083962-A2 PHOTORESIST COMPOSITION FOR THE FORMATION OF THICK FILMS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-09-30 WO disclosed