Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.52 |
| ▸ | POLB | P06746 | 1/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | PPARG | P37231 | 1/20 | 0.43 |
| ▸ | PPARA | Q07869 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.42 |
| ▸ | MMP8 | P22894 | 1/20 | 0.41 |
| ▸ | AOC3 | Q16853 | 3/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.40 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.40 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15581118 | 0.88 | ACHE (0.40) | LMNAPOLBMAPK1HPGDALOX15 | |
| SCHEMBL1357122 | 0.83 | LMNA (0.48) | LMNAPOLBTSHRAOC3KDM4E | |
| SCHEMBL19309188 | 0.80 | EPHX1 (0.45) | LMNAPOLBHPGDL3MBTL1MEN1 | |
| SCHEMBL24120490 | 0.80 | ESR1 (0.50) | LMNAALOX15TSHRKDM4EHIF1A | |
| SCHEMBL722846 | 0.79 | LMNA (0.45) | LMNAPOLBTSHRNPSR1L3MBTL1 | |
| SCHEMBL19798765 | 0.78 | LMNA (0.44) | LMNAHPGDALOX15TSHRNPSR1 | |
| SCHEMBL19312229 | 0.78 | LMNA (0.48) | LMNAPOLBMAPK1HPGDALOX15 | |
| SCHEMBL5699081 | 0.78 | LMNA (0.48) | LMNAPOLBMAPK1ALOX15TSHR | |
| SCHEMBL19289270 | 0.78 | ALDH1A1 (0.44) | HPGDNPSR1AOC3MEN1ALDH1A1 | |
| SCHEMBL13314726 | 0.78 | GAA (0.44) | LMNAMAPK1NPSR1ADRA2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107207380-B | Mild catalytic reduction of C-O bonds and C ═ O bonds using a recyclable catalyst system | 有机燃料瑞典公司 | 2021-06-15 | — | — | CN | claimed |
| CN-107532017-B | Stripping solvent composition, stripping method and cleaning solvent composition | 日本瑞翁株式会社 | 2020-11-06 | — | — | CN | claimed |
| CN-110597025-A | Photoresist stripping liquid composition for color filter | 华璞微电子科技(宁波)有限公司 | 2019-12-20 | — | — | CN | claimed |
| CN-107207380-A | C O keys and C=O keys mild catalytic are reduced using recyclable catalyst system | 有机燃料瑞典公司 | 2017-09-26 | — | — | CN | claimed |
| WO-2012007008-A1 | INHIBITORS OF HDME | EPITHERAPEUTICS APS (DK) | 2012-01-19 | — | — | WO | claimed |
| EP-1934162-A2 | METHOD OF MAKING BENZYLATED PHENOLS | General Electric Company (US) | 2008-06-25 | — | — | EP | claimed |
| WO-2007027375-A2 | METHOD OF MAKING BENZYLATED PHENOLS | GENERAL ELECTRIC COMPANY (US) | 2007-03-08 | — | — | WO | claimed |
| EP-3239261-B1 | METHOD FOR PRODUCING AN ADHESIVE COMPOSITION AND A LAMINATE | TOYO INK SC HOLDINGS CO LTD (JP) | 2023-11-29 | — | — | EP | disclosed |
| CN-107207380-B | Mild catalytic reduction of C-O bonds and C ═ O bonds using a recyclable catalyst system | 有机燃料瑞典公司 | 2021-06-15 | — | — | CN | disclosed |
| CN-112236216-A | Method for purifying fluorine-containing solvent-containing substance and purified product of fluorine-containing solvent | 日本瑞翁株式会社 | 2021-01-15 | — | — | CN | disclosed |
| WO-2021001240-A1 | HYDROGENATION OF ESTERS TO ALCOHOLS IN THE PRESENCE OF A RU-PNN COMPLEX | BASF SE (DE) | 2021-01-07 | — | — | WO | disclosed |
| CN-112189002-A | Method for purifying solvent | 日本瑞翁株式会社 | 2021-01-05 | — | — | CN | disclosed |
| CN-107532017-B | Stripping solvent composition, stripping method and cleaning solvent composition | 日本瑞翁株式会社 | 2020-11-06 | — | — | CN | disclosed |
| EP-1538181-A1 | POLYMER WITH DISPERSED FINE METAL PARTICLES, PROCESS FOR PRODUCING THE SAME, METAL ION-CONTAINING POLYMER FOR USE IN THE PRODUCTION, AND PROCESS FOR PRODUCING THE SAME | Japan Science and Technology Agency (JP) | 2005-06-08 | — | — | EP | disclosed |
| EP-1425329-A1 | PROCESS FOR REDUCING RESIDUAL ISOCYANATE | 3M Innovative Properties Company (US) | 2004-06-09 | — | — | EP | disclosed |
| WO-2003022901-A1 | PROCESS FOR REDUCING RESIDUAL ISOCYANATE | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2003-03-20 | — | — | WO | disclosed |
| US-6177070-B1 | REACTIVE ALDEHYDES THAT FORM UNSATURATED COMPOUNDS | LYNCH UNA E (US) | 2001-01-23 | — | — | US | disclosed |
| EP-0793144-B1 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-17 | — | — | EP | disclosed |
| US-5962180-A | COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT | JSR CORPORATION (JP) | 1999-10-05 | — | — | US | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |