Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.70 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.70 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.70 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.70 |
| ▸ | TP53 | P04637 | 1/20 | 0.70 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.70 |
| ▸ | TSHR | P16473 | 5/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | CA2 | P00918 | 6/20 | 0.47 |
| ▸ | CA9 | Q16790 | 5/20 | 0.47 |
| ▸ | CA12 | O43570 | 3/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 4/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL1785689 | 0.84 | ALDH1A1 (0.73) | ALDH1A1ALOX15CYP3A4TDP1TP53 | |
| SCHEMBL8468934 | 0.83 | ALDH1A1 (1.00) | ALDH1A1ALOX15CYP3A4TDP1TP53 | |
| SCHEMBL15246 | 0.83 | ALDH1A1 (1.00) | ALDH1A1ALOX15CYP3A4TDP1TP53 | |
| Sulfuric Acid SCHEMBL3671954 | 0.83 | ALDH1A1 (0.70) | ALDH1A1ALOX15CYP3A4TDP1TP53 | |
| Hydrochloric Acid SCHEMBL971113 | 0.81 | ALDH1A1 (0.94) | ALDH1A1ALOX15CYP3A4TDP1TP53 | |
| Ammonia Solution, Strong SCHEMBL28575167 | 0.81 | ALDH1A1 (0.94) | ALDH1A1ALOX15CYP3A4TDP1TP53 | |
| Water SCHEMBL6142579 | 0.81 | ALDH1A1 (0.94) | ALDH1A1ALOX15CYP3A4TDP1TP53 | |
| SCHEMBL4356329 | 0.81 | ALDH1A1 (0.94) | ALDH1A1ALOX15CYP3A4TDP1TP53 | |
| Bromide SCHEMBL2353262 | 0.81 | ALDH1A1 (0.94) | ALDH1A1ALOX15CYP3A4TDP1TP53 | |
| Hydrochloric Acid SCHEMBL309541 | 0.81 | ALDH1A1 (0.94) | ALDH1A1ALOX15CYP3A4TDP1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1270608-B2 | POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL | SEKISUI CHEMICAL CO LTD (JP) | 2010-10-20 | — | — | EP | disclosed |
| EP-1429400-B1 | MODIFIED POLYVINYL ACETAL RESIN | SEKISUI CHEMICAL CO LTD (JP) | 2009-08-26 | — | — | EP | disclosed |
| US-7176257-B2 | Polyvinyl acetal resin for heat-developable photosensitive material and heat-developable photosensitive material | SEKISUI CHEMICAL CO., LTD. (JP) | 2007-02-13 | — | — | US | disclosed |
| EP-1270608-B1 | POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL | SEKISUI CHEMICAL CO LTD (JP) | 2005-10-12 | — | — | EP | disclosed |
| US-20040260020-A1 | Obtained by acetalizing a modified polyvinyl alcohol having ethylene in a random basis as a constituent unit of a main chain and an ethylene content of 1 to 20 mole % and a saponification degree of 80 mole % or more; improved flexibility and adhesion under high humidity; ceramic green sheets, inks | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-20040166449-A1 | Polyvinyl acetal resin for heat-developable photosensitive material and heat-developable photosensitive material | SEKISUI CHEMICAL CO., LTD. | 2004-08-26 | — | — | US | disclosed |
| EP-1429400-A1 | MODIFIED POLYVINYL ACETAL RESIN | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-06-16 | — | — | EP | disclosed |
| US-6730464-B2 | POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIALS AS WELL AS A HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL WHILE SOLVING SUCH PROBLEMS AS COATING SOLUTION POT LIFE, COLORATION OF HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL, | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-05-04 | — | — | US | disclosed |
| US-20030109636-A1 | Polyvinyl acetal resin for heat -developable photosensitive material and heat-developable photosenstive material | SEKISUI CHEMICAL CO., LTD. (JP) | 2003-06-12 | — | — | US | disclosed |