SCHEMBL3683149

SCHEMBL3683149

C=C(C)C(=O)OCOCC1(C)C2CC3CC(C2)CC1C3

nearest known ligand 0.41

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.41
THRB P10828 1/20 0.36
TSHR P16473 3/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15928282 0.88 ALDH1A1 (0.41) ALDH1A1THRBTSHR
SCHEMBL855402 0.79 ALDH1A1 (0.45) ALDH1A1THRBTSHR
SCHEMBL3694984 0.78 ALDH1A1 (0.34) ALDH1A1THRBTSHR
SCHEMBL1310160 0.76 ALDH1A1 (0.42) ALDH1A1THRBTSHR
SCHEMBL6367827 0.75 ALDH1A1 (0.31) ALDH1A1
SCHEMBL75487 0.75 ALDH1A1 (0.41) ALDH1A1THRBTSHR
SCHEMBL23377974 0.75 ALDH1A1 (0.38) ALDH1A1THRBTSHR
SCHEMBL47525 0.74 CYP17A1 (0.30) ALDH1A1
SCHEMBL18897882 0.74 ALDH1A1 (0.30) ALDH1A1
SCHEMBL12263940 0.74 THRB (0.44) ALDH1A1THRBTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023580-B2 Method of forming polymeric compound, resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-05-05 US disclosed
US-20130137049-A1 METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-30 US disclosed
US-7687222-B2 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-30 US disclosed
US-7687222-B2 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-30 US disclosed
US-7687222-B2 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-30 US disclosed
US-20080008962-A1 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-01-10 US disclosed
US-20080008962-A1 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-01-10 US disclosed
US-20080008962-A1 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-01-10 US disclosed