Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.45 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 4/20 | 0.36 |
| ▸ | MAPT | P10636 | 3/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3797993 | 0.87 | ALDH1A1 (0.54) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL20349638 | 0.87 | ALDH1A1 (0.54) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL2739905 | 0.83 | ALDH1A1 (0.50) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL13963874 | 0.81 | CYP3A4 (0.37) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL1506678 | 0.81 | ALDH1A1 (0.46) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL13963880 | 0.80 | THRB (0.37) | ALDH1A1MEN1KMT2AL3MBTL1THRB | |
| SCHEMBL12021005 | 0.79 | KMT2A (0.42) | ALDH1A1MEN1KMT2AMAPTATM | |
| SCHEMBL13963878 | 0.79 | CYP3A4 (0.34) | ALDH1A1MEN1KMT2AL3MBTL1MAPT | |
| SCHEMBL13963852 | 0.79 | NPSR1 (0.38) | ALDH1A1MEN1KMT2AL3MBTL1MAPT | |
| SCHEMBL13963876 | 0.79 | ALDH1A1 (0.34) | ALDH1A1MEN1KMT2AL3MBTL1CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9023580-B2 | Method of forming polymeric compound, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| EP-2433972-B1 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2014-11-12 | — | — | EP | disclosed |
| EP-2433972-B1 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2014-11-12 | — | — | EP | disclosed |
| EP-1717261-B1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2014-01-01 | — | — | EP | disclosed |
| EP-1717261-B1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2014-01-01 | — | — | EP | disclosed |
| US-20130137049-A1 | METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| EP-2433972-A1 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2012-03-28 | — | — | EP | disclosed |
| US-7723007-B2 | Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-25 | — | — | US | disclosed |
| US-7723007-B2 | Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-25 | — | — | US | disclosed |
| US-7723007-B2 | Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-25 | — | — | US | disclosed |
| US-7718342-B2 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-05-18 | — | — | US | disclosed |
| US-20080166655-A1 | Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method | OGATA TOSHIYUKI | 2008-07-10 | — | — | US | disclosed |
| US-20080166655-A1 | Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method | OGATA TOSHIYUKI | 2008-07-10 | — | — | US | disclosed |
| US-20080166655-A1 | Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method | OGATA TOSHIYUKI | 2008-07-10 | — | — | US | disclosed |
| US-20070148594-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-06-28 | — | — | US | disclosed |
| EP-1717261-A1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-11-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080166655-A1 | Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method | CRHR1, ADH1C, ADH1A | ALDH1A1 253/4885MEN1 3193/4885KMT2A 1751/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.