Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.30 |
| ▸ | CPT2 | P23786 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28187342 | 0.83 | ALDH1A1 (0.48) | GAA | |
| SCHEMBL28375445 | 0.80 | GAA (0.34) | GAAFFAR1CPT2TDP1 | |
| SCHEMBL609525 | 0.80 | LMNA (0.39) | GAAFFAR1CPT2TDP1 | |
| Hydrochloric Acid SCHEMBL11627695 | 0.78 | LMNA (0.38) | GAA | |
| SCHEMBL1964653 | 0.78 | GAA (0.33) | GAA | |
| SCHEMBL6136823 | 0.78 | GAA (0.33) | GAA | |
| SCHEMBL33483 | 0.76 | GAA (0.32) | GAA | |
| SCHEMBL13885738 | 0.76 | ALDH1A1 (0.35) | GAA | |
| SCHEMBL608106 | 0.76 | CA2 (0.36) | FFAR1TDP1 | |
| Hydrochloric Acid SCHEMBL27819113 | 0.76 | KDM4E (0.37) | GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8097402-B2 | Using electric-field directed post-exposure bake for double-patterning (D-P) | TOKYO ELECTRON LIMITED (JP) | 2012-01-17 | — | — | US | disclosed |
| WO-2010114716-A1 | USING ELECTRIC-FIELD DIRECTED POST-EXPOSURE BAKE FOR DOUBLE PATTERNING (D-P) | TOKYO ELECTRON LIMITED (JP) | 2010-10-07 | — | — | WO | disclosed |
| US-20100248152-A1 | Using Electric-Field Directed Post-Exposure Bake for Double-Patterning (D-P) | TOKYO ELECTRON LIMITED (JP) | 2010-09-30 | — | — | US | disclosed |
| US-7763404-B2 | Methods and apparatus for changing the optical properties of resists | TOKYO ELECTRON LIMITED (JP) | 2010-07-27 | — | — | US | disclosed |
| US-7555395-B2 | Methods and apparatus for using an optically tunable soft mask to create a profile library | TOKYO ELECTRON LIMITED (JP) | 2009-06-30 | — | — | US | disclosed |
| US-20080077362-A1 | METHODS AND APPARATUS FOR USING AN OPTICALLY TUNABLE SOFT MASK TO CREATE A PROFILE LIBRARY | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080074678-A1 | ACCURACY OF OPTICAL METROLOGY MEASUREMENTS | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080074677-A1 | ACCURACY OF OPTICAL METROLOGY MEASUREMENTS | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080076045-A1 | METHODS AND APPARATUS FOR CHANGING THE OPTICAL PROPERTIES OF RESISTS | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | disclosed |
| US-7300730-B1 | Creating an optically tunable anti-reflective coating | TOKYO ELECTRON LIMITED (JP) | 2007-11-27 | — | — | US | disclosed |
| US-6770418-B2 | ACID-CATALYZED POSITIVE RESIST COMPOSITIONS SUITABLE FOR BILAYER OR MULTILAYER LITHOGRAPHIC APPLICATIONS ARE ENABLED BY THE USE OF A COMBINATION OF (A) AN ACID-SENSITIVE IMAGING POLYMER, (B) A RADIATION SENSITIVE ACID GENERATOR, AND (C) A | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-08-03 | — | — | US | disclosed |
| US-20030124453-A1 | Positive resist compositions containing non-polymeric silicon aditives | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2003-07-03 | — | — | US | disclosed |