Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.86 |
| ▸ | HPGD | P15428 | 3/20 | 0.86 |
| ▸ | TSHR | P16473 | 1/20 | 0.86 |
| ▸ | LMNA | P02545 | 1/20 | 0.68 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.63 |
| ▸ | HSD11B1 | P28845 | 6/20 | 0.62 |
| ▸ | HSD11B2 | P80365 | 1/20 | 0.57 |
| ▸ | GRM5 | P41594 | 1/20 | 0.55 |
| ▸ | HTT | P42858 | 1/20 | 0.53 |
| ▸ | CHRNB2 | P17787 | 2/20 | 0.52 |
| ▸ | CHRNA3 | P32297 | 2/20 | 0.52 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.52 |
| ▸ | CHRNB3 | Q05901 | 2/20 | 0.52 |
| ▸ | CHRNA6 | Q15825 | 2/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2386976 | 1.00 | ALDH1A1 (0.86) | ALDH1A1HPGDTSHRLMNASMN1; SMN2 | |
| SCHEMBL60471 | 1.00 | ALDH1A1 (0.86) | ALDH1A1HPGDTSHRLMNASMN1; SMN2 | |
| SCHEMBL4057588 | 1.00 | ALDH1A1 (0.86) | ALDH1A1HPGDTSHRLMNASMN1; SMN2 | |
| SCHEMBL1826063 | 1.00 | ALDH1A1 (0.86) | ALDH1A1HPGDTSHRLMNASMN1; SMN2 | |
| SCHEMBL3703489 | 0.97 | ALDH1A1 (0.81) | ALDH1A1HPGDTSHRLMNASMN1; SMN2 | |
| SCHEMBL12714626 | 0.95 | HPGD (0.86) | ALDH1A1HPGDTSHRLMNASMN1; SMN2 | |
| SCHEMBL3706273 | 0.95 | HPGD (0.86) | ALDH1A1HPGDTSHRLMNASMN1; SMN2 | |
| SCHEMBL1309352 | 0.95 | ALDH1A1 (0.86) | ALDH1A1HPGDTSHRLMNASMN1; SMN2 | |
| SCHEMBL19612780 | 0.92 | HPGD (1.00) | ALDH1A1HPGDTSHRLMNASMN1; SMN2 | |
| SCHEMBL10559542 | 0.92 | ALDH1A1 (1.00) | ALDH1A1HPGDTSHRLMNASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109894622-A | It is a kind of by nano wire be converted into quantum dot method and quantum dot obtained | 国家纳米科学中心 | 2019-06-18 | — | — | CN | claimed |
| CN-107974313-A | A kind of preparation method of octane number accelerating agent | 广州市东泓川发新能源有限公司 | 2018-05-01 | — | — | CN | claimed |
| CN-107974311-A | A kind of octane number accelerating agent | 广州市东泓川发新能源有限公司 | 2018-05-01 | — | — | CN | claimed |
| EP-4636011-A1 | POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4553100-A1 | POLYMER, POSITIVE AND NEGATIVE PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-05-14 | — | — | EP | disclosed |
| CN-119955091-A | Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| US-20250147420-A1 | Polymer, Positive And Negative Photosensitive Resin Compositions, Patterning Process, Method For Forming Cured Film, Interlayer Insulating Film, Surface Protective Film, And Electronic Component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-05-08 | — | — | US | disclosed |
| US-12195568-B2 | Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-01-14 | — | — | US | disclosed |
| US-12085856-B2 | Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-10 | — | — | US | disclosed |
| CN-118210199-A | Photosensitive resin composition, cured film pattern, and method for producing same | 奇美实业股份有限公司 | 2024-06-18 | — | — | CN | disclosed |
| US-11892773-B2 | Photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-06 | — | — | US | disclosed |
| EP-2010186-B1 | HALOARYL SUBSTITUTED AMINOPURINES, COMPOSITIONS THEREOF, AND METHODS OF TREATMENT THEREWITH | SIGNAL PHARM LLC (US) | 2012-12-26 | — | — | EP | disclosed |
| US-20120122842-A1 | NAMPT AND ROCK INHIBITORS | ABBOTT LABORATORIES (US) | 2012-05-17 | — | — | US | disclosed |
| WO-2012061057-A1 | METHODS OF TREATMENT AND/OR PREVENTION OF SCLERODERMA, UV INJURY OR SUNBURN, FORMATION OF SCARS OR KELOIDS BY USING HALOARYL SUBSTITUTED AMINOPURINES | SIGNAL PHARMACEUTICALS, LLC (US) | 2012-05-10 | — | — | WO | disclosed |
| EP-2112151-A2 | Haloaryl substituted aminopurines, compositions thereof, and methods of treatment therewith | Signal Pharmaceuticals LLC (US) | 2009-10-28 | — | — | EP | disclosed |
| EP-1838710-B1 | HALOARYL SUBSTITUTED AMINOPURINES, COMPOSITIONS THEREOF, AND METHODS OF TREATMENT THEREWITH | SIGNAL PHARM LLC (US) | 2009-07-01 | — | — | EP | disclosed |
| WO-2007127382-A1 | HALOARYL SUBSTITUTED AMINOPURINES, COMPOSITIONS THEREOF, AND METHODS OF TREATMENT THEREWITH | SIGNAL PHARMACEUTICALS, LLC (US) | 2007-11-08 | — | — | WO | disclosed |
| WO-2006076595-A1 | HALOARYL SUBSTITUTED AMINOPURINES, COMPOSITIONS THEREOF, AND METHODS OF TREATMENT THEREWITH | SIGNAL PHARMACEUTICALS, LLC (US) | 2006-07-20 | — | — | WO | disclosed |
| WO-2005061457-A1 | ORGANIC COMPOUNDS | SPEEDEL EXPERIMENTA AG (CH) | 2005-07-07 | — | — | WO | disclosed |
| US-3947458-A | RHODIUM CATALYST, REACTING NITROGEN COMPOUND, OLEFIN, CARBON MONOXIDE, WATER | MONSANTO COMPANY (US) | 1976-03-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120122842-A1 | NAMPT AND ROCK INHIBITORS | NAMPT, NNMT, NME2 | ALDH1A1 2689/4885HPGD 132/4885TSHR 2661/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.