Hydrochloric Acid

Hydrochloric Acid

SCHEMBL3735013

CC1=C(c2cccc3ccccc23)c2ccccc2C1[Zr+2](C1C(C)=C(c2cccc3ccccc23)c2ccccc21)=[Si](c1ccccc1)c1ccccc1.[Cl-].[Cl-]

nearest known ligand 0.32

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A2 known ✓ P23975 1/20 0.30
SLC6A3 known ✓ Q01959 1/20 0.30
KDM4E B2RXH2 4/20 0.32
ENPP3 O14638 1/20 0.32
ENPP1 P22413 1/20 0.32
ALDH1A1 P00352 4/20 0.32
HPGD P15428 3/20 0.32
CYP2A6 P11509 1/20 0.31
DHFR P00374 1/20 0.31
EDNRB P24530 1/20 0.30
EDNRA P25101 1/20 0.30
LMNA P02545 1/20 0.30
HSD17B10 Q99714 1/20 0.30
TDP2 O95551 1/20 0.30
MAPT P10636 1/20 0.30
ALOX12 P18054 1/20 0.30
MAPK1 P28482 1/20 0.30
CASP3 P42574 1/20 0.30
HTT P42858 1/20 0.30
GALK1 P51570 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL7938957 0.90 KDM4E (0.33) KDM4EENPP3ENPP1ALDH1A1HPGD
Hydrochloric Acid SCHEMBL3759506 0.86 KDM4E (0.33) KDM4EENPP3ENPP1ALDH1A1HPGD
Hydrochloric Acid SCHEMBL339001 0.86 KDM4E (0.33) KDM4EENPP3ENPP1ALDH1A1HPGD
Hydrochloric Acid SCHEMBL2114856 0.81 DHFR (0.36) KDM4EENPP3ENPP1ALDH1A1HPGD
Hydrochloric Acid SCHEMBL7926942 0.80 KDM4E (0.34) KDM4EENPP3ENPP1ALDH1A1HPGD
Hydrochloric Acid SCHEMBL216963 0.78 KDM4E (0.33) KDM4EENPP3ENPP1ALDH1A1HPGD
Hydrochloric Acid SCHEMBL7211659 0.78 KDM4E (0.33) KDM4EENPP3ENPP1ALDH1A1HPGD
Hydrochloric Acid SCHEMBL7724262 0.78 KDM4E (0.33) KDM4EENPP3ENPP1ALDH1A1HPGD
Hydrochloric Acid SCHEMBL7935472 0.78 KDM4E (0.32) KDM4EALDH1A1HPGDCYP2A6DHFR
Hydrochloric Acid SCHEMBL217589 0.78 KDM4E (0.32) KDM4EALDH1A1HPGDCYP2A6DHFR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100280197-A1 MODIFIED PARTICLE, SUPPORT, CATALYST COMPONENT FOR ADDITION POLYMERIZATION, CATALYST FOR ADDITION POLYMERIZATION, AND PROCESS FOR PRODUCING ADDITION POLYMER TAKAOKI KAZUO 2010-11-04 US disclosed
EP-0982328-B1 Propylene resin compositions, process for the preparation thereof, and use thereof. IDEMITSU PETROCHEMICAL CO (JP) 2003-07-23 EP disclosed
US-20030069127-A1 Modified particle,support, catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMTED (JP) 2003-04-10 US disclosed
EP-1275662-A1 MODIFIED PARTICLE, SUPPORT, CATALYST COMPONENT FOR ADDITION POLYMERIZATION, CATALYST FOR ADDITION POLYMERIZATION, AND PROCESS FOR PRODUCING ADDITION POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-01-15 EP disclosed
US-20020072569-A1 Polyolefin resin modifier, polyolefin resin composition and oriented polyolefin film IDEMITSU PETROCHEMICAL CO., LTD. 2002-06-13 US disclosed
US-6339128-B1 PACKAGING, THICKNESS ACCURACY OF THE FORMED FILM AND STRETCHABILITY IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2002-01-15 US disclosed
EP-1153938-A1 CATALYST FOR STEREOREGULAR POLYMERIZATION OF ALPHA-OLEFIN AND PROCESS FOR PRODUCING STEREOREGULAR ALPHA-OLEFIN POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-11-14 EP disclosed
US-6268063-B1 BLEND OF POLYPROPYLENE AND ETHYLENE-PROPYLENE COPOLYMER;FLEXIBILITY, RADIATION TRANSPARENT TOKUYAMA CORPORATION (JP) 2001-07-31 US disclosed
US-6184402-B1 RESOLUTION OF A STEREOISOMERIC MIXTURE OF SPECIFIC METALLOCENE COMPLEXES BRIDGED WITH A TRANSITION METAL HAVING AN OXYGEN BOND ATTACHED, I.E., A MU-OXO COMPLEX; HYDROLYSIS IN THE PRESENCE OF A BASE; SEPARATION OF MESO FORM FROM MIXES CHISSO CORPORATION (JP) 2001-02-06 US disclosed
EP-1041114-A1 Polyolefin resin modifier, polyolefin resin composition and oriented polyolefin film TOKUYAMA CORPORATION (JP) 2000-10-04 EP disclosed
EP-0982328-A1 Propylene resin compositions, process for the preparation thereof, and use thereof. TOKUYAMA CORPORATION (JP) 2000-03-01 EP disclosed