Methacrylic Acid

Methacrylic Acid

SCHEMBL3739485

C=C(C(=O)O)C(C=C(C)C(=O)O)Cc1ccccc1.C=C(C)C(=O)O

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MME P08473 3/20 0.40
HPGD P15428 1/20 0.40
CYP2C9 P11712 1/20 0.40
ALPI P09923 1/20 0.40
PKM P14618 1/20 0.40
PTGS1 P23219 1/20 0.40
XIAP P98170 1/20 0.40
SLC7A5 Q01650 1/20 0.40
CYP1A2 P05177 1/20 0.39
TAAR1 Q96RJ0 1/20 0.38
CPA1 P15085 3/20 0.38
CPB1 P15086 1/20 0.38
CPA3 P15088 1/20 0.38
CPB2 Q96IY4 1/20 0.38
AKR1C3 P42330 1/20 0.38
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
CTRB1 P17538 2/20 0.37
ALDH1A1 P00352 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2951352 0.97 ALPI (0.42) MMEHPGDCYP2C9ALPIPKM
Toluene SCHEMBL8474940 0.92 MME (0.38) MMEHPGDCYP2C9ALPIPKM
SCHEMBL3072863 0.82 THRB (0.48) MMEALDH1A1
Methacrylic Acid SCHEMBL2287000 0.80 CNR2 (0.43) CYP2C9ALPIPKMPTGS1XIAP
SCHEMBL15639721 0.79 TBXAS1 (0.41) MMEHPGDCYP2C9ALPIPKM
SCHEMBL6845371 0.78 CYP1A2 (0.46) MMEALPIPKMPTGS1XIAP
SCHEMBL2912969 0.77 SLC15A1 (0.53) MMEHPGDALPIPKMPTGS1
SCHEMBL963649 0.76 CYP3A4 (0.32) MMEHPGDCYP2C9
SCHEMBL28474427 0.74 NPC1 (0.47) HPGDCYP2C9ALPIPKMPTGS1
SCHEMBL12193980 0.74 NPC1 (0.47) HPGDCYP2C9ALPIPKMPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7829257-B2 Photosensitive resin composition CIBA SPECIALTY CHEMICALS CORP. (US) 2010-11-09 US disclosed
US-20020020832-A1 Photosensitive resin composition CIBA SPECIALTY CHEMICALS CORP. 2002-02-21 US disclosed