SCHEMBL3743987

SCHEMBL3743987

C=C(C(=O)OC12CC3CC(CC(C3)C1)C2)C(CCC)OC

nearest known ligand 0.34

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 3/20 0.33
ALDH1A1 P00352 5/20 0.32
EPHX2 P34913 3/20 0.32
CYP17A1 P05093 2/20 0.32
NAAA Q02083 1/20 0.32
KMT2A Q03164 4/20 0.31
MEN1 O00255 3/20 0.31
L3MBTL1 Q9Y468 2/20 0.31
TSHR P16473 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
MAPT P10636 1/20 0.30
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL677512 0.78 KMT2A (0.45) CYP19A1ALDH1A1EPHX2CYP17A1NAAA
SCHEMBL678026 0.76 CYP19A1 (0.40) CYP19A1ALDH1A1EPHX2CYP17A1NAAA
SCHEMBL451260 0.73 EPHX2 (0.37) CYP19A1ALDH1A1EPHX2CYP17A1NAAA
SCHEMBL16369107 0.73 CYP19A1 (0.40) CYP19A1ALDH1A1EPHX2CYP17A1NAAA
SCHEMBL283707 0.72 CYP19A1 (0.39) CYP19A1ALDH1A1EPHX2CYP17A1NAAA
SCHEMBL4742705 0.72 CYP19A1 (0.40) CYP19A1ALDH1A1EPHX2CYP17A1NAAA
SCHEMBL217993 0.71 CYP19A1 (0.36) CYP19A1ALDH1A1EPHX2CYP17A1NAAA
SCHEMBL1821532 0.71 EPHX2 (0.45) EPHX2KMT2A
SCHEMBL45476 0.70 NAAA (0.40) CYP19A1ALDH1A1EPHX2CYP17A1NAAA
SCHEMBL22769989 0.70 CYP19A1 (0.38) CYP19A1ALDH1A1EPHX2CYP17A1NAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7834113-B2 Photoresist compositions and processes for preparing the same E. I. DU PONT DE NEMOURS AND COMPANY (US) 2010-11-16 US claimed
US-20060247400-A1 Photoresist compositions and processes for preparing the same U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2006-11-02 US claimed
US-7834113-B2 Photoresist compositions and processes for preparing the same E. I. DU PONT DE NEMOURS AND COMPANY (US) 2010-11-16 US disclosed
EP-2049577-A2 METHODS FOR PREPARING POLYMERS FROM PHENOLIC MATERIALS AND COMPOSITIONS RELATING THERETO Dupont Electronic Polymers L.P. (US) 2009-04-22 EP disclosed
EP-1497339-B1 ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY DUPONT ELECTRONIC TECHNOLOGIES (US) 2008-07-30 EP disclosed
WO-2008016496-A2 METHODS FOR PREPARING POLYMERS FROM PHENOLIC MATERIALS AND COMPOSITIONS RELATING THERETO DUPONT ELECTRONIC POLYMERS L.P. (US) 2008-02-07 WO disclosed
US-20060247400-A1 Photoresist compositions and processes for preparing the same U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2006-11-02 US disclosed
WO-2006091375-A1 ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY DUPONT ELECTRONIC POLYMERS L.P. (US) 2006-08-31 WO disclosed
EP-1497339-A1 ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY Dupont Electronic Technologies L.P. (US) 2005-01-19 EP disclosed
WO-2003089480-A1 ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) 2003-10-30 WO disclosed