Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KIF11 | P52732 | 12/20 | 0.48 |
| ▸ | KCNH2 | Q12809 | 3/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | CHRM2 | P08172 | 3/20 | 0.37 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.37 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.37 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.37 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.37 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL6517997 | 0.87 | KIF11 (0.53) | KIF11KCNH2CYP2D6CYP3A4CYP2C9 | |
| Tetrabuthylammonium SCHEMBL1350363 | 0.85 | KIF11 (0.44) | KIF11KCNH2CYP2D6CYP3A4CYP2C9 | |
| SCHEMBL7747170 | 0.85 | KIF11 (0.59) | KIF11KCNH2CYP2D6CYP3A4CYP2C9 | |
| Lithium Ion SCHEMBL8852232 | 0.85 | KIF11 (0.59) | KIF11KCNH2CYP2D6CYP3A4CYP2C9 | |
| SCHEMBL8772313 | 0.85 | KIF11 (0.59) | KIF11KCNH2CYP2D6CYP3A4CYP2C9 | |
| SCHEMBL8350816 | 0.83 | KIF11 (0.43) | KIF11CYP3A4 | |
| Tetrylammonium SCHEMBL3361497 | 0.83 | KIF11 (0.34) | KIF11KCNH2 | |
| Tetrylammonium SCHEMBL3361102 | 0.81 | KIF11 (0.38) | KIF11KCNH2CYP2D6CYP3A4CYP2C9 | |
| Tetrabuthylammonium SCHEMBL810025 | 0.79 | KIF11 (0.42) | KIF11KCNH2CYP2D6CYP3A4CYP2C9 | |
| Tetrylammonium SCHEMBL3360743 | 0.78 | KIF11 (0.33) | KIF11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118119658-A | Composition for forming conductive elastomer, and polymer | 大阪有机化学工业株式会社 | 2024-05-31 | — | — | CN | disclosed |
| WO-2023074722-A1 | COMPOSITION FOR FORMING ELECTROCONDUCTIVE ELASTOMER, ELECTROCONDUCTIVE ELASTOMER, AND POLYMER | 大阪有機化学工業株式会社 | 2023-05-04 | — | — | WO | disclosed |
| EP-3890038-A1 | PIEZOELECTRIC MATERIAL AND COMPOSITION FOR PIEZOELECTRIC MATERIAL | Osaka Organic Chemical Industry Ltd. (JP) | 2021-10-06 | — | — | EP | disclosed |
| WO-2021029362-A1 | NOVEL FIRING TEMPERATURE REDUCING AGENT FOR CONDUCTIVE MATERIAL | 大阪有機化学工業株式会社 | 2021-02-18 | — | — | WO | disclosed |
| WO-2021029361-A1 | NOVEL ELECTRIC CONDUCTIVITY IMPROVING AGENT | 大阪有機化学工業株式会社 | 2021-02-18 | — | — | WO | disclosed |
| WO-2021029360-A1 | METHOD FOR MANUFACTURING SUBSTRATE COATED WITH ELECTROCONDUCTIVE MATERIAL, MULTI-LAYER MATERIAL, AND SUBSTRATE COATED WITH ELECTROCONDUCTIVE MATERIAL | 大阪有機化学工業株式会社 | 2021-02-18 | — | — | WO | disclosed |
| WO-2021029359-A1 | CONDUCTIVITY IMPROVING AGENT | 大阪有機化学工業株式会社 | 2021-02-18 | — | — | WO | disclosed |
| WO-2020012660-A1 | PIEZOELECTRIC MATERIAL AND COMPOSITION FOR PIEZOELECTRIC MATERIAL | 株式会社イデアルスター | 2020-01-16 | — | — | WO | disclosed |
| WO-2009157975-A3 | METHOD FOR TEMPERING AN ALUMINUM ALLOY | STANDEX INTERNATIONAL CORPORATION (US) | 2012-05-10 | — | — | WO | disclosed |
| EP-2128865-B1 | Optical recording composition, holographic recording medium, and method of recording and reproducing information | FUJIFILM CORP (JP) | 2012-02-29 | — | — | EP | disclosed |
| US-20070072124-A1 | Optical recording composition, production method thereof and optical recording medium | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |
| US-20070072088-A1 | Composition for hologram recording media, hologram recording medium and method for producing the same, hologram recording method and hologram reproducing method | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |
| EP-1768114-A2 | Optical recording method, optical recording apparatus, optical recording medium and optical reproducing method | FUJIFILM Corporation (JP) | 2007-03-28 | — | — | EP | disclosed |
| US-20070047419-A1 | Optical recording method, optical recording apparatus, optical recording medium, and optical reproducing method | FUJI PHOTO FILM CO., LTD. | 2007-03-01 | — | — | US | disclosed |
| US-20070047421-A1 | Optical recording method, optical recording apparatus, optical recording medium, and optical reproducing method | FUJI PHOTO FILM CO., LTD. | 2007-03-01 | — | — | US | disclosed |
| EP-0387087-B1 | Photoinitiator compositions, photohardenable compositions and photosensitive microcapsules | CYCOLOR INC (US) | 1997-10-08 | — | — | EP | disclosed |
| US-5230982-A | Heterocyclic disulfides for crosslinking | THE MEAD CORPORATION (US) | 1993-07-27 | — | — | US | disclosed |
| EP-0387086-A2 | Photoinitiator compositions, photohardenable compositions containing the same | THE MEAD CORPORATION (US) | 1990-09-12 | — | — | EP | disclosed |
| EP-0387087-A2 | Photoinitiator compositions, photohardenable compositions and photosensitive microcapsules | THE MEAD CORPORATION (US) | 1990-09-12 | — | — | EP | disclosed |
| US-4954415-A | Photoresists, photolithography | THE MEAD CORPORATION (US) | 1990-09-04 | — | — | US | disclosed |