Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NQO1 | P15559 | 1/20 | 0.52 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.51 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.51 |
| ▸ | MAPT | P10636 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.50 |
| ▸ | LTA4H | P09960 | 1/20 | 0.48 |
| ▸ | CA12 | O43570 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | CA4 | P22748 | 1/20 | 0.47 |
| ▸ | CA6 | P23280 | 1/20 | 0.47 |
| ▸ | CA5A | P35218 | 1/20 | 0.47 |
| ▸ | CA7 | P43166 | 1/20 | 0.47 |
| ▸ | CA9 | Q16790 | 1/20 | 0.47 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.47 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.47 |
| ▸ | CYP11B1 | P15538 | 2/20 | 0.46 |
| ▸ | CYP11B2 | P19099 | 2/20 | 0.46 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23458226 | 0.87 | NQO1 (0.62) | NQO1AKR1C3AKR1C2MAPTALDH1A1 | |
| SCHEMBL3821099 | 0.87 | NQO1 (0.62) | NQO1AKR1C3AKR1C2MAPTALDH1A1 | |
| SCHEMBL29779700 | 0.87 | NQO1 (0.62) | NQO1AKR1C3AKR1C2MAPTALDH1A1 | |
| SCHEMBL3825385 | 0.87 | NQO1 (0.68) | NQO1AKR1C3AKR1C2MAPTALDH1A1 | |
| SCHEMBL29629327 | 0.87 | NQO1 (0.68) | NQO1AKR1C3AKR1C2MAPTALDH1A1 | |
| SCHEMBL741708 | 0.84 | ESR1 (0.57) | NQO1AKR1C3AKR1C2MAPTALDH1A1 | |
| SCHEMBL14686116 | 0.83 | LTA4H (0.59) | NQO1AKR1C3AKR1C2MAPTALDH1A1 | |
| SCHEMBL4579370 | 0.83 | POLB (0.53) | AKR1C3AKR1C2MAPTALDH1A1HSD17B10 | |
| SCHEMBL1051397 | 0.83 | LTA4H (0.57) | NQO1MAPTALDH1A1HSD17B10LTA4H | |
| SCHEMBL8558909 | 0.81 | NQO1 (0.54) | NQO1AKR1C3AKR1C2MAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024176757-A1 | PROTECTIVE FILM FORMING COMPOSITION, SEMICONDUCTOR SUBSTRATE, AND ELECTRONIC COMPONENT | 日産化学株式会社 | 2024-08-29 | — | — | WO | disclosed |
| EP-2866093-A1 | Anti-reflective coating forming composition containing vinyl ether compound and polyimide | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 2015-04-29 | — | — | EP | disclosed |
| CN-102981368-B | Antireflective film-forming composition containing vinyl ether compound | NISSAN CHEMICAL IND LTD | 2015-03-04 | — | — | CN | disclosed |
| US-8501393-B2 | Lithography; photoresists; semiconductors | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| EP-2592476-A1 | Antireflective coating forming composition containing vinyl ether compound and polyimide | Nissan Chemical Industries, Ltd. (JP) | 2013-05-15 | — | — | EP | disclosed |
| US-7846638-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| EP-1560070-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2009-12-30 | — | — | EP | disclosed |
| US-7425399-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-16 | — | — | US | disclosed |
| US-20080206680-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080138744-A1 | Anti-Reflective Coating Forming Composition Containing Vinyl Ether Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-06-12 | — | — | US | disclosed |
| EP-1757987-A1 | ANTIREFLECTIVE FILM-FORMING COMPOSITION CONTAINING VINYL ETHER COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-20060290429-A1 | Composition form forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-28 | — | — | US | disclosed |
| EP-1560070-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2005-08-03 | — | — | EP | disclosed |