Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NQO1 | P15559 | 1/20 | 0.68 |
| ▸ | CA12 | O43570 | 1/20 | 0.57 |
| ▸ | CA1 | P00915 | 1/20 | 0.57 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.57 |
| ▸ | CA4 | P22748 | 1/20 | 0.57 |
| ▸ | CA6 | P23280 | 1/20 | 0.57 |
| ▸ | CA5A | P35218 | 1/20 | 0.57 |
| ▸ | CA7 | P43166 | 1/20 | 0.57 |
| ▸ | CA9 | Q16790 | 1/20 | 0.57 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.57 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.57 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.56 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.56 |
| ▸ | CYP11B1 | P15538 | 2/20 | 0.55 |
| ▸ | CYP11B2 | P19099 | 2/20 | 0.55 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.55 |
| ▸ | TSHR | P16473 | 3/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.54 |
| ▸ | TP53 | P04637 | 2/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29629327 | 1.00 | NQO1 (0.68) | NQO1CA12CA1CYP1A2CA4 | |
| SCHEMBL29779700 | 0.95 | NQO1 (0.62) | NQO1CA12CA1CYP1A2CA4 | |
| SCHEMBL23458226 | 0.95 | NQO1 (0.62) | NQO1CA12CA1CYP1A2CA4 | |
| SCHEMBL3821099 | 0.95 | NQO1 (0.62) | NQO1CA12CA1CYP1A2CA4 | |
| SCHEMBL18417197 | 0.91 | NQO1 (0.56) | NQO1CA12CA1CYP1A2CA4 | |
| SCHEMBL30209608 | 0.91 | AGXT (0.63) | NQO1CA12CA1CYP1A2CA4 | |
| SCHEMBL17629449 | 0.91 | AGXT (0.63) | NQO1CA12CA1CYP1A2CA4 | |
| SCHEMBL2662879 | 0.91 | CYP11B1 (0.65) | NQO1CA12CA1CYP1A2CA4 | |
| SCHEMBL111274 | 0.91 | AGXT (0.63) | NQO1CA12CA1CYP1A2CA4 | |
| SCHEMBL29357645 | 0.91 | AGXT (0.63) | NQO1CA12CA1CYP1A2CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118206435-A | Hetero [4] arene macrocyclic compound, preparation method thereof and application thereof in detection of silver ions and iron ions | 东北大学 | 2024-06-18 | — | — | CN | claimed |
| CN-118206435-A | Hetero [4] arene macrocyclic compound, preparation method thereof and application thereof in detection of silver ions and iron ions | 东北大学 | 2024-06-18 | — | — | CN | disclosed |
| US-11814527-B2 | Three-dimensional printing with supramolecular templated hydrogels | TRUSTEES OF DARTMOUTH COLLEGE (US) | 2023-11-14 | — | — | US | disclosed |
| CN-116830039-A | Photosensitive resin composition, photosensitive resin sheet, cured product, hollow structure, electronic component, and elastic wave filter | 东丽株式会社 | 2023-09-29 | — | — | CN | disclosed |
| WO-2023153390-A1 | PHOTOSENSITIVE RESIN SHEET, CURED FILM, AND MULTILAYER WIRING SUBSTRATE | 東レ株式会社 | 2023-08-17 | — | — | WO | disclosed |
| CN-116360211-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2023-06-30 | — | — | CN | disclosed |
| CN-114730127-B | Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter | 东丽株式会社 | 2023-05-12 | — | — | CN | disclosed |
| WO-2022163610-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, CURED PRODUCT, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER | 東レ株式会社 | 2022-08-04 | — | — | WO | disclosed |
| CN-114730127-A | Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter | 东丽株式会社 | 2022-07-08 | — | — | CN | disclosed |
| US-20220214617-A1 | MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, COMPOUND, AND POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-07 | — | — | US | disclosed |
| US-10474031-B2 | Photosensitive resin composition, photosensitive resin composition film, cured product, insulating film and multilayer wiring board | TORAY INDUSTRIES, INC. (JP) | 2019-11-12 | — | — | US | disclosed |
| US-20180052391-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, INSULATING FILM AND MULTILAYER WIRING BOARD | TORAY INDUSTRIES, INC. (JP) | 2018-02-22 | — | — | US | disclosed |
| EP-3276414-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, INSULATING FILM AND MULTILAYER WIRING BOARD | Toray Industries, Inc. (JP) | 2018-01-31 | — | — | EP | disclosed |
| US-20170336728-A1 | ULTRAVIOLET CURABLE LIQUID COMPOSITION, ULTRAVIOLET CURING INKJET INK, ULTRAVIOLET CURING WET ELECTROPHOTOGRAPHIC LIQUID DEVELOPER, ULTRAVIOLET CURING ELECTROSTATIC INKJET INK, AND IMAGE FORMING METHOD USING THEREOF | CANON KABUSHIKI KAISHA (JP) | 2017-11-23 | — | — | US | disclosed |
| US-20170033290-A1 | FLUOROALKYLFLUORENE DERIVATIVES | LOMOX LIMITED (GB) | 2017-02-02 | — | — | US | disclosed |
| EP-1298115-B1 | PROCESS FOR THE PREPARATION OF POLYHYDRIC ALCOHOLS | NAT INST OF ADVANCED IND SCIEN (JP) | 2009-08-26 | — | — | EP | disclosed |
| US-6656328-B2 | Subjecting a polyhydric alcohol compound having protected hydroxy group(s) to microwave irradiation in presence of basic compound or acid to deprotect the protecting groups of hydroxy group of polyhydric alcohol compound | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2003-12-02 | — | — | US | disclosed |
| EP-1298115-A1 | PROCESS FOR THE PREPARATION OF POLYHYDRIC ALCOHOLS | National Institute of Advanced Industrial Science and Technology (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-20020157939-A1 | Process for preparation of polyhydric alcohols | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2002-10-31 | — | — | US | disclosed |
| US-4229274-A | PHOTOINITIATOR, PHOTOSENSITIZER, QUENCHER, AND COMPOUNDS CONTAINING ACRYLYLOXY GROUPS | PPG INDUSTRIES, INC. (US) | 1980-10-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170033290-A1 | FLUOROALKYLFLUORENE DERIVATIVES | FLNB, AFF2, EFHD2 | NQO1 1228/4885CA12 4116/4885CA1 4568/4885 |
| US-20220214617-A1 | MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, COMPOUND, AND POLYMER | RER1, SMC4, RAD51 | NQO1 4374/4885CA12 2285/4885CA1 1290/4885 |
| US-20020157939-A1 | Process for preparation of polyhydric alcohols | ADH1C, ADH1A, ADH5 | NQO1 1435/4885CA12 512/4885CA1 195/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.