Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.38 |
| ▸ | SNCA | P37840 | 1/20 | 0.34 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.34 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.33 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.33 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.33 |
| ▸ | CYP11B1 | P15538 | 2/20 | 0.33 |
| ▸ | CYP11B2 | P19099 | 2/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.33 |
| ▸ | CYP2B6 | P20813 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.33 |
| ▸ | ERN1 | O75460 | 1/20 | 0.33 |
| ▸ | ABCC9 | O60706 | 1/20 | 0.32 |
| ▸ | ABCC8 | Q09428 | 1/20 | 0.32 |
| ▸ | KCNJ11 | Q14654 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3759525 | 0.81 | KMT2A (0.39) | PTGS1CYP1A2CYP2C9HSD17B1HSD17B2 | |
| Hydrochloric Acid SCHEMBL31497693 | 0.77 | ALDH1A1 (0.39) | NFE2L2CYP2C9PTGS2CA12CA1 | |
| Hydrochloric Acid SCHEMBL31497694 | 0.77 | ALDH1A1 (0.39) | NFE2L2CYP2C9PTGS2CA12CA1 | |
| SCHEMBL794898 | 0.75 | ALDH1A1 (0.41) | NFE2L2CYP2C9PTGS2CA12CA1 | |
| SCHEMBL29420741 | 0.75 | ALDH1A1 (0.41) | NFE2L2CYP2C9PTGS2CA12CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL29353026 | 0.75 | PTGS1 (0.37) | PTGS1NFE2L2CYP2C9HSD17B1HSD17B2 | |
| Trifluoromethanesulfonic Acid SCHEMBL3287537 | 0.75 | PTGS1 (0.37) | PTGS1NFE2L2CYP2C9HSD17B1HSD17B2 | |
| Trifluoromethanesulfonic Acid SCHEMBL3287542 | 0.71 | HSD17B10 (0.34) | PTGS1NFE2L2CYP3A4CYP2C9HSD17B1 | |
| SCHEMBL19469378 | 0.71 | ESR1 (0.33) | PTGS1NFE2L2CYP2C9 | |
| Trifluoromethanesulfonic Acid SCHEMBL5827351 | 0.70 | PTGS1 (0.37) | PTGS1NFE2L2CYP2C9HSD17B1HSD17B2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7842441-B2 | Norbornene polymer for photoresist and photoresist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-11-30 | — | — | US | disclosed |
| US-20090075207-A1 | NORBORNENE POLYMER FOR PHOTORESIST AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-03-19 | — | — | US | disclosed |
| US-20080145783-A1 | Photosensitive Resin Composition and Organic Insulating Film Produced Using the Same | CHEIL INDUSTRIES INC. (KR) | 2008-06-19 | — | — | US | disclosed |
| US-20060188806-A1 | Norbornene polymer for photoresist and photoresist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-08-24 | — | — | US | disclosed |
| US-20050090570-A1 | Composition for forming dielectric film and method for forming dielectric film or pattern using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-04-28 | — | — | US | disclosed |