SCHEMBL794898

SCHEMBL794898

C[S+](C)c1ccc(O)c2ccc(O)cc12

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.41
LMNA P02545 2/20 0.41
ALOX15 P16050 2/20 0.41
HTT P42858 2/20 0.41
HSD17B10 Q99714 2/20 0.41
NR1I2 O75469 2/20 0.41
CYP2C9 P11712 1/20 0.41
MIF P14174 1/20 0.41
TYR P14679 1/20 0.41
NFE2L2 Q16236 1/20 0.41
ESR1 P03372 7/20 0.37
ESR2 Q92731 7/20 0.37
MAOB P27338 1/20 0.36
IDO1 P14902 1/20 0.36
KDM4E B2RXH2 1/20 0.34
MAPT P10636 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
CSNK2A1 P68400 1/20 0.33
TLR8 Q9NR97 1/20 0.33
CA12 O43570 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29420741 1.00 ALDH1A1 (0.41) ALDH1A1LMNAALOX15HTTHSD17B10
Hydrochloric Acid SCHEMBL31497694 0.98 ALDH1A1 (0.39) ALDH1A1LMNAALOX15HTTHSD17B10
Hydrochloric Acid SCHEMBL31497693 0.98 ALDH1A1 (0.39) ALDH1A1LMNAALOX15HTTHSD17B10
SCHEMBL6232078 0.92 ALDH1A1 (0.41) ALDH1A1LMNAALOX15HTTHSD17B10
SCHEMBL19469378 0.87 ESR1 (0.33) ALDH1A1LMNAALOX15HTTHSD17B10
Trifluoromethanesulfonic Acid SCHEMBL3287542 0.84 HSD17B10 (0.34) ALDH1A1LMNAALOX15HTTHSD17B10
Trifluoromethanesulfonic Acid SCHEMBL3287537 0.83 PTGS1 (0.37) ALDH1A1LMNAALOX15HTTHSD17B10
SCHEMBL3759525 0.81 KMT2A (0.39) ALDH1A1LMNAHTTHSD17B10CYP2C9
SCHEMBL7783966 0.78 IDO1 (0.50) ALDH1A1LMNAALOX15HTTHSD17B10
SCHEMBL5698053 0.77 CA1 (0.34) CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 271 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250213434-A1 DENTAL CURABLE COMPOSITION HAVING FAVORABLE COLOR COMPATIBILITY KURARAY NORITAKE DENTAL INC. (JP) 2025-07-03 US disclosed
EP-4505992-A1 DENTAL CURABLE COMPOSITION HAVING FAVORABLE COLOR COMPATIBILITY Kuraray Noritake Dental Inc. (JP) 2025-02-12 EP disclosed
EP-4091578-B1 METHOD FOR PRODUCING PLATE DENTURE TOKUYAMA DENTAL CORP (JP) 2024-10-09 EP disclosed
WO-2024075641-A1 POLYMER MATERIAL FOR USE IN DENTISTRY サンメディカル株式会社 2024-04-11 WO disclosed
US-11857385-B2 Method of producing plate denture, curable composition for stereolithography, and plate denture production kit TOKUYAMA DENTAL CORPORATION (JP) 2024-01-02 US disclosed
WO-2023243636-A1 MEMBER PROCESSING METHOD 日東電工株式会社 2023-12-21 WO disclosed
WO-2023243634-A1 TRANSFER SHEET 日東電工株式会社 2023-12-21 WO disclosed
CN-114929158-B Method for producing denture, curable composition for photoforming, and kit for producing denture 株式会社德山齿科 2023-10-20 CN disclosed
WO-2023191112-A1 DENTAL CURABLE COMPOSITION HAVING FAVORABLE COLOR COMPATIBILITY クラレノリタケデンタル株式会社 2023-10-05 WO disclosed
US-20230287179-A1 HIGHLY SOLUBLE TRIS-(2,3-EPOXYPROPYL)-ISOCYANURATE AND METHOD FOR PRODUCING SAME NISSAN CHEMICAL CORPORATION (JP) 2023-09-14 US disclosed
US-20060188806-A1 Norbornene polymer for photoresist and photoresist composition comprising the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-08-24 US disclosed
US-20050250868-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-10 US disclosed
EP-1591098-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-02 EP disclosed
US-20050227166-A1 Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film MURAKAMI CO., LTD. (JP) 2005-10-13 US disclosed
US-6930134-B2 Photocationic polymerization initiator and photocationically polymerizable composition TOKUYAMA CORPORATION (JP) 2005-08-16 US disclosed
EP-1553449-A1 ACTIVE ENERGY RAY SENSITIVE RESIN COMPOSITION, ACTIVE ENERGY RAY SENSITIVE RESIN FILM AND METHOD FOR FORMING PATTERN USING SAID FILM Murakami Co., Ltd. (JP) 2005-07-13 EP disclosed
US-20040186195-A1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORPORATION (JP) 2004-09-23 US disclosed
US-20040132853-A1 Photocationic polymerization initiator and photocationically polymerizable composition TOKUYAMA CORPORATION (JP) 2004-07-08 US disclosed
EP-1431315-A2 Photopolymerization initiator and photopolymerizable composition Tokuyama Corporation (JP) 2004-06-23 EP disclosed
EP-1422254-A2 Photocationic polymerization initiator and photocationically polymerizable composition Tokuyama Corporation (JP) 2004-05-26 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230287179-A1 HIGHLY SOLUBLE TRIS-(2,3-EPOXYPROPYL)-ISOCYANURATE AND METHOD FOR PRODUCING SAME TTPA, USP1, USP2 ALDH1A1 874/4885LMNA 2413/4885ALOX15 4124/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.