Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.39 |
| ▸ | MEN1 | O00255 | 3/20 | 0.39 |
| ▸ | GAA | P10253 | 3/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.39 |
| ▸ | EP300 | Q09472 | 1/20 | 0.39 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.39 |
| ▸ | KAT8 | Q9H7Z6 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | CYTH2 | Q99418 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | P4HB | P07237 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1130239 | 0.85 | EP300 (0.51) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL29420741 | 0.81 | ALDH1A1 (0.41) | ESR1ESR2ALDH1A1LMNAHSD17B10 | |
| SCHEMBL794898 | 0.81 | ALDH1A1 (0.41) | ESR1ESR2ALDH1A1LMNAHSD17B10 | |
| Trifluoromethanesulfonic Acid SCHEMBL3287537 | 0.81 | PTGS1 (0.37) | KMT2AMEN1GAAESR1ESR2 | |
| Trifluoromethanesulfonic Acid SCHEMBL29353026 | 0.81 | PTGS1 (0.37) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL3766321 | 0.81 | NAPRT (0.38) | KMT2AGAAPTGS1CYP1A2CYP2C9 | |
| Hydrochloric Acid SCHEMBL31497694 | 0.80 | ALDH1A1 (0.39) | ESR1ESR2ALDH1A1LMNAHSD17B10 | |
| Hydrochloric Acid SCHEMBL31497693 | 0.80 | ALDH1A1 (0.39) | ESR1ESR2ALDH1A1LMNAHSD17B10 | |
| Trifluoromethanesulfonic Acid SCHEMBL3287542 | 0.77 | HSD17B10 (0.34) | GAAESR1ESR2PTGS1ALDH1A1 | |
| SCHEMBL19469378 | 0.76 | ESR1 (0.33) | ESR1ESR2PTGS1ALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7842441-B2 | Norbornene polymer for photoresist and photoresist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-11-30 | — | — | US | disclosed |
| US-20090075207-A1 | NORBORNENE POLYMER FOR PHOTORESIST AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-03-19 | — | — | US | disclosed |
| US-20080145783-A1 | Photosensitive Resin Composition and Organic Insulating Film Produced Using the Same | CHEIL INDUSTRIES INC. (KR) | 2008-06-19 | — | — | US | disclosed |
| US-20060188806-A1 | Norbornene polymer for photoresist and photoresist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-08-24 | — | — | US | disclosed |
| EP-1601729-B1 | INK JET INK COMPOSITION AND METHOD FOR SECURITY MAKING | VIDEOJET TECHNOLOGIES INC (US) | 2006-06-21 | — | — | EP | disclosed |
| US-20050090570-A1 | Composition for forming dielectric film and method for forming dielectric film or pattern using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-04-28 | — | — | US | disclosed |