⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2524347 | 0.84 | — | — | |
| SCHEMBL430721 | 0.71 | — | — | |
| SCHEMBL377532 | 0.71 | — | — | |
| SCHEMBL25220941 | 0.67 | — | — | |
| SCHEMBL49557 | 0.67 | — | — | |
| SCHEMBL11150558 | 0.63 | — | — | |
| SCHEMBL303170 | 0.63 | — | — | |
| SCHEMBL2099803 | 0.63 | — | — | |
| SCHEMBL2524116 | 0.63 | — | — | |
| SCHEMBL19426996 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250313953-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2025-10-09 | — | — | US | claimed |
| US-12378667-B2 | Methods and systems for forming doped silicon nitride films | ASM IP HOLDING B.V. (NL) | 2025-08-05 | — | — | US | claimed |
| US-20240359430-A1 | THERMAL CHEMICAL VAPOR DEPOSITION COATING PROCESS | SILCOTEK CORP | 2024-10-31 | — | — | US | claimed |
| US-20230126516-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2023-04-27 | — | — | US | claimed |
| US-20210087708-A1 | NANO-WIRE GROWTH | SILCOTEK CORP. | 2021-03-25 | — | — | US | claimed |
| US-5487967-A | Surface-imaging technique for lithographic processes for device fabrication | AT&T CORP. (US) | 1996-01-30 | — | — | US | claimed |
| US-20260125789-A1 | MANUFACTURING PROCESS WITH REDUCED TRANSPORT OF METAL IONS, MANUFACTURED PRODUCTS, AND STORED PRODUCTS | SILCOTEK CORP (US) | 2026-05-07 | — | — | US | disclosed |
| US-20260129933-A1 | CHEMICAL VAPOR DEPOSITION PROCESS AND COATING | SILCOTEK CORP (US) | 2026-05-07 | — | — | US | disclosed |
| US-20260042880-A1 | CONTROLLABLE EXTENSION OF FLEXIBLE OLIGOMERIC DIOLS AND METHODS THEREOF | THE BOEING COMPANY (US) | 2026-02-12 | — | — | US | disclosed |
| EP-4692167-A1 | CONTROLLABLE EXTENSION OF FLEXIBLE OLIGOMERIC DIOLS AND METHODS THEREOF | The Boeing Company (US) | 2026-02-11 | — | — | EP | disclosed |
| US-20260028715-A1 | DIELECTRIC ARTICLE | SILCOTEK CORP (US) | 2026-01-29 | — | — | US | disclosed |
| US-20250362277-A1 | LIQUID CHROMATOGRAPHY TECHNIQUE | SILCOTEK CORP (US) | 2025-11-27 | — | — | US | disclosed |
| US-12473635-B2 | Dielectric article | SILCOTEK CORP. (US) | 2025-11-18 | — | — | US | disclosed |
| US-20180258529-A1 | THERMAL CHEMICAL VAPOR DEPOSITION COATING | SILCOTEK CORP (US) | 2018-09-13 | — | — | US | disclosed |
| US-20180163308-A1 | FLUORO-CONTAINING THERMAL CHEMICAL VAPOR DEPOSITION PROCESS AND ARTICLE | SILCOTEK CORP. | 2018-06-14 | — | — | US | disclosed |
| US-20170211180-A1 | DIFFUSION-RATE-LIMITED THERMAL CHEMICAL VAPOR DEPOSITION COATING | SILCOTEK CORP. | 2017-07-27 | — | — | US | disclosed |
| EP-3196335-A1 | DIFFUSION-RATE-LIMITED THERMAL CHEMICAL VAPOR DEPOSITION COATING | Silcotek Corp. (US) | 2017-07-26 | — | — | EP | disclosed |
| EP-3192894-A1 | SILICON-NITRIDE-CONTAINING THERMAL CHEMICAL VAPOR DEPOSITION COATING | Silcotek Corp. (US) | 2017-07-19 | — | — | EP | disclosed |
| US-20170167015-A1 | SILICON-NITRIDE-CONTAINING THERMAL CHEMICAL VAPOR DEPOSITION COATING | SILCOTEK CORP. | 2017-06-15 | — | — | US | disclosed |
| US-5487967-A | Surface-imaging technique for lithographic processes for device fabrication | AT&T CORP. (US) | 1996-01-30 | — | — | US | disclosed |