SCHEMBL3785245

SCHEMBL3785245

Nc1ccc(B2OB(c3ccc(N)cc3)OB(c3ccc(N)cc3)O2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.47
MAPT P10636 2/20 0.47
KMT2A Q03164 2/20 0.47
CYP3A4 P08684 7/20 0.40
TDP1 Q9NUW8 7/20 0.40
ALDH1A1 P00352 6/20 0.40
TP53 P04637 2/20 0.40
MAPK1 P28482 4/20 0.36
ALOX15 P16050 3/20 0.36
HSD17B10 Q99714 2/20 0.36
ACHE P22303 1/20 0.36
CA3 P07451 1/20 0.36
THRB P10828 1/20 0.36
CA6 P23280 1/20 0.36
CASP1 P29466 1/20 0.36
HIF1A Q16665 1/20 0.36
CA14 Q9ULX7 1/20 0.36
MASP2 O00187 1/20 0.36
PLAU P00749 1/20 0.36
THPO P40225 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12513168 0.74 MEN1 (0.38) MEN1MAPTKMT2ACYP3A4TDP1
SCHEMBL20312430 0.72 MEN1 (0.36) MEN1MAPTKMT2ACYP3A4TDP1
SCHEMBL55445 0.72 LPL (0.59) CA3CA6CA14F2PRSS1
Lithium SCHEMBL31733916 0.71 LPL (0.57) CA3CA6CA14F2PRSS1
SCHEMBL17618241 0.69 LPL (0.39) TDP1ALDH1A1MAPK1ACHECA3
SCHEMBL3787345 0.69 CYP3A4 (0.50) MEN1MAPTKMT2ACYP3A4TDP1
SCHEMBL320609 0.69 MEN1 (1.00) MEN1MAPTKMT2ACYP3A4TDP1
SCHEMBL27981 0.69
SCHEMBL14983378 0.67 LPL (0.59) CYP3A4TDP1ALDH1A1MAPK1HSD17B10
SCHEMBL12267625 0.65 TSHR (0.46) MAPTTDP1ALDH1A1TP53MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
US-20100087680-A1 METHOD FOR PRODUCING BIARYL COMPOUND SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2010-04-08 US disclosed
EP-1914221-A1 PROCESS FOR PRODUCING BIARYL COMPOUND Sumitomo Chemical Company, Limited (JP) 2008-04-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100087680-A1 METHOD FOR PRODUCING BIARYL COMPOUND NISCH, BLVRB, BBOX1 MEN1 174/4885MAPT 3312/4885KMT2A 1474/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.