SCHEMBL3785669

SCHEMBL3785669

C=COCCOc1ccc(S(OS(=O)(=O)c2c(C(C)C)cc(C(C)C)cc2C(C)C)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PSEN1 P49768 1/20 0.37
PSEN2 P49810 1/20 0.37
APH1B Q8WW43 1/20 0.37
NCSTN Q92542 1/20 0.37
APH1A Q96BI3 1/20 0.37
PSENEN Q9NZ42 1/20 0.37
ENPP3 O14638 2/20 0.37
ENPP1 P22413 2/20 0.37
L3MBTL1 Q9Y468 2/20 0.34
GAA P10253 1/20 0.34
MAPK1 P28482 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
FABP3 P05413 1/20 0.33
FABP4 P15090 1/20 0.33
FABP5 Q01469 1/20 0.33
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
MAPT P10636 1/20 0.32
FFAR1 O14842 1/20 0.32
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3778774 0.89 ENPP3 (0.34) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL3919028 0.81 CA12 (0.40) L3MBTL1GAAMAPK1TDP1MEN1
SCHEMBL383992 0.81 FABP4 (0.47) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL3785667 0.79 PSEN1 (0.36) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL5549809 0.78 FABP3 (0.42) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL5549720 0.78 ENPP3 (0.41) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL17627839 0.77 ENPP3 (0.52) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL2691695 0.75 FABP3 (0.39) ENPP3ENPP1GAATDP1FABP3
SCHEMBL5549116 0.73 FABP4 (0.46) ENPP3ENPP1GAATDP1FABP3
SCHEMBL3776619 0.72 RAB9A (0.36) L3MBTL1GAAMEN1KMT2AFFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7858287-B2 Photosensitive resin, and photosensitive composition HYOGO PREFECTURE (JP) 2010-12-28 US disclosed
US-20090142697-A1 PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION TOYO GOSEI CO., LTD. (JP) 2009-06-04 US disclosed