Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP4 | P15090 | 4/20 | 0.47 |
| ▸ | FABP3 | P05413 | 2/20 | 0.47 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.47 |
| ▸ | ENPP3 | O14638 | 2/20 | 0.43 |
| ▸ | ENPP1 | P22413 | 2/20 | 0.43 |
| ▸ | PSEN1 | P49768 | 1/20 | 0.38 |
| ▸ | PSEN2 | P49810 | 1/20 | 0.38 |
| ▸ | APH1B | Q8WW43 | 1/20 | 0.38 |
| ▸ | NCSTN | Q92542 | 1/20 | 0.38 |
| ▸ | APH1A | Q96BI3 | 1/20 | 0.38 |
| ▸ | PSENEN | Q9NZ42 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.36 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.36 |
| ▸ | PIK3CB | P42338 | 1/20 | 0.36 |
| ▸ | PIK3CG | P48736 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5549809 | 0.93 | FABP3 (0.42) | FABP4FABP3FABP5ENPP3ENPP1 | |
| SCHEMBL2691695 | 0.90 | FABP3 (0.39) | FABP4FABP3FABP5ENPP3ENPP1 | |
| SCHEMBL2634748 | 0.88 | FABP3 (0.40) | FABP4FABP3FABP5ENPP3ENPP1 | |
| SCHEMBL5549720 | 0.88 | ENPP3 (0.41) | FABP4FABP3FABP5ENPP3ENPP1 | |
| SCHEMBL17627839 | 0.87 | ENPP3 (0.52) | FABP4FABP3FABP5ENPP3ENPP1 | |
| SCHEMBL5549116 | 0.87 | FABP4 (0.46) | FABP4FABP3FABP5ENPP3ENPP1 | |
| SCHEMBL2634463 | 0.83 | FABP4 (0.43) | FABP4FABP3FABP5ENPP3ENPP1 | |
| SCHEMBL2946584 | 0.82 | FABP4 (0.62) | FABP4FABP3FABP5ENPP3ENPP1 | |
| SCHEMBL3785669 | 0.81 | PSEN1 (0.37) | FABP4FABP3FABP5ENPP3ENPP1 | |
| SCHEMBL17627840 | 0.80 | ENPP1 (0.46) | ENPP3ENPP1PSEN1PSEN2APH1B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 265 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6953651-B2 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-10-11 | — | — | US | claimed |
| US-20020164548-A1 | Wet etch compatible deep UV photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. | 2002-11-07 | — | — | US | claimed |
| WO-2002069042-A1 | WET ETCH COMPATIBLE DEEP UV PHOTORESIST COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-09-06 | — | — | WO | claimed |
| US-6200480-B1 | CONTACTING IMPURE SOLUTION OF PHOTOACID GENERATING COMPOUND CONTAINING TRACE AMOUNTS OF ACIDIC IMPURITIES WITH ANIONIC ION EXCHANGE RESIN CONTAINING PENDENT POLYAMINE FUNCTIONAL GROUPS FOR SUFFICIENT AMOUNT OF TIME TO REMOVE SAID IMPURITIES | ARCH SPECIALTY CHEMICALS, INC. | 2001-03-13 | — | — | US | claimed |
| EP-1054715-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | Olin Microelectronic Chemicals, Inc. (US) | 2000-11-29 | — | — | EP | claimed |
| WO-1999036151-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-07-22 | — | — | WO | claimed |
| EP-2256552-B1 | Negative resist composition and patterning process using the same | SHINETSU CHEMICAL CO (JP) | 2017-07-12 | — | — | EP | disclosed |
| EP-2413192-B1 | POLYMERIZABLE MONOMERS | SHINETSU CHEMICAL CO (JP) | 2016-12-21 | — | — | EP | disclosed |
| US-9411225-B2 | Photo acid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-09 | — | — | US | disclosed |
| EP-2345934-B1 | Negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| US-20160004155-A1 | PHOTO ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-07 | — | — | US | disclosed |
| EP-2244124-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-26 | — | — | EP | disclosed |
| EP-2244126-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-1225479-A2 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-6346363-B2 | CONTAINING POLYSILOXANE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-02-12 | — | — | US | disclosed |
| US-20010038967-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-08 | — | — | US | disclosed |
| EP-1152295-A1 | Tertiary-butyl acrylate polymers and their use in photoresist compositions | Arch Specialty Chemicals, Inc. (US) | 2001-11-07 | — | — | EP | disclosed |
| US-6200480-B1 | CONTACTING IMPURE SOLUTION OF PHOTOACID GENERATING COMPOUND CONTAINING TRACE AMOUNTS OF ACIDIC IMPURITIES WITH ANIONIC ION EXCHANGE RESIN CONTAINING PENDENT POLYAMINE FUNCTIONAL GROUPS FOR SUFFICIENT AMOUNT OF TIME TO REMOVE SAID IMPURITIES | ARCH SPECIALTY CHEMICALS, INC. | 2001-03-13 | — | — | US | disclosed |
| EP-1054715-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | Olin Microelectronic Chemicals, Inc. (US) | 2000-11-29 | — | — | EP | disclosed |
| WO-1999036151-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-07-22 | — | — | WO | disclosed |