SCHEMBL3786559

SCHEMBL3786559

O=C(CCn1ccnc1)Oc1cccc2ccccc12

nearest known ligand 0.53

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
POLB P06746 1/20 0.49
PIN1 Q13526 1/20 0.47
TBXAS1 P24557 4/20 0.47
EGLN3 Q9H6Z9 1/20 0.46
FNTA P49354 2/20 0.45
FNTB P49356 2/20 0.45
PGGT1B P53609 1/20 0.45
MAPK1 P28482 2/20 0.45
QPCT Q16769 1/20 0.45
LMNA P02545 1/20 0.45
TP53 P04637 1/20 0.45
MAPT P10636 1/20 0.45
ALDH1A1 P00352 2/20 0.44
ALOX15 P16050 1/20 0.43
HSD17B10 Q99714 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11249190 0.78 KDM4E (0.53) KDM4EL3MBTL1POLBTBXAS1EGLN3
SCHEMBL11370297 0.78 ALDH1A1 (0.59) KDM4EL3MBTL1PIN1MAPK1ALDH1A1
SCHEMBL8685340 0.78 LMNA (0.67) POLBTBXAS1MAPK1LMNAALDH1A1
Hydrochloric Acid SCHEMBL11399269 0.77 KDM4E (0.52) KDM4EL3MBTL1POLBTBXAS1EGLN3
SCHEMBL25244833 0.75 ALDH1A1 (0.56) KDM4EL3MBTL1PIN1MAPK1ALDH1A1
SCHEMBL11253198 0.74 KDM4E (0.44) KDM4EL3MBTL1POLBTBXAS1FNTA
SCHEMBL3797170 0.74 TDP1 (0.57) KDM4EL3MBTL1PIN1MAPK1ALDH1A1
SCHEMBL11304827 0.73 ALDH1A1 (0.54) KDM4EL3MBTL1PIN1MAPK1ALDH1A1
SCHEMBL21275376 0.73 HTR1B (0.54) KDM4EL3MBTL1PIN1MAPK1ALDH1A1
SCHEMBL29373398 0.73 ALDH1A1 (0.58) KDM4EL3MBTL1MAPK1ALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8283104-B2 Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-10-09 US disclosed
US-20100209827-A1 NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-08-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100209827-A1 NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME DAP3, MRPS23, ASIC3 KDM4E 3897/4885L3MBTL1 4272/4885POLB 2591/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.