Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.35 |
| ▸ | POLB | P06746 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1641200 | 0.82 | TDP1 (0.34) | ALDH1A1TDP1POLBKDM4EAPOBEC3G | |
| SCHEMBL4119473 | 0.81 | AKR1C3 (0.32) | — | |
| SCHEMBL8893948 | 0.77 | KDM4E (0.32) | ALDH1A1TDP1POLBKDM4EAPOBEC3G | |
| SCHEMBL8341038 | 0.77 | KDM4E (0.32) | ALDH1A1TDP1POLBKDM4EAPOBEC3G | |
| SCHEMBL4122580 | 0.74 | APEX1 (0.35) | ALDH1A1TDP1POLBKDM4EAPOBEC3G | |
| SCHEMBL7121273 | 0.70 | L3MBTL1 (0.33) | ALDH1A1L3MBTL1GAATDP1POLB | |
| SCHEMBL4112058 | 0.69 | POLB (0.35) | POLB | |
| SCHEMBL1696772 | 0.69 | HPGD (0.36) | ALDH1A1TDP1KDM4E | |
| SCHEMBL10231795 | 0.69 | GRM1 (0.34) | KDM4E | |
| SCHEMBL9138194 | 0.69 | ALDH1A1 (0.35) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115210411-B | Filled microstructure and method of transporting the same | 富士胶片株式会社 | 2025-04-01 | — | — | CN | disclosed |
| WO-2024203030-A1 | JOINED BODY MANUFACTURING METHOD AND STRUCTURE SET | 富士フイルム株式会社 | 2024-10-03 | — | — | WO | disclosed |
| CN-115003864-B | Method for manufacturing metal-filled microstructure | 富士胶片株式会社 | 2024-08-16 | — | — | CN | disclosed |
| CN-115135809-B | Metal-filled microstructure, method for producing metal-filled microstructure, and structure | 富士胶片株式会社 | 2024-07-19 | — | — | CN | disclosed |
| CN-113423872-B | Anodic oxidation method and method for producing anisotropic conductive member | 富士胶片株式会社 | 2024-06-04 | — | — | CN | disclosed |
| US-12002713-B2 | Method for manufacturing structure | FUJIFILM CORPORATION (JP) | 2024-06-04 | — | — | US | disclosed |
| WO-2024053564-A1 | PHOTOSENSITIVE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | 住友ベークライト株式会社 | 2024-03-14 | — | — | WO | disclosed |
| CN-116830391-A | Structure, method for producing anisotropic conductive member, and composition for forming protective layer | 富士胶片株式会社 | 2023-09-29 | — | — | CN | disclosed |
| CN-116092726-A | Anisotropic conductive member, method for producing anisotropic conductive member, structure, and method for producing structure | 富士胶片株式会社 | 2023-05-09 | — | — | CN | disclosed |
| CN-116057681-A | Structure, method for manufacturing structure, method for manufacturing bonded body, and method for manufacturing device | 富士胶片株式会社 | 2023-05-02 | — | — | CN | disclosed |
| US-20080242090-A1 | Using amino acid derivative and surfactant as polishing mixture | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080242090-A1 | Using amino acid derivative and surfactant as polishing mixture | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| CN-101275057-A | Metal-polishing liquid and polishing method | FUJI FILM CORP (JP) | 2008-10-01 | — | — | CN | disclosed |
| US-20080206995-A1 | METAL-POLISHING LIQUID AND POLISHING METHOD THEREWITH | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080206995-A1 | METAL-POLISHING LIQUID AND POLISHING METHOD THEREWITH | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080206995-A1 | METAL-POLISHING LIQUID AND POLISHING METHOD THEREWITH | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| CN-101230238-A | Metal-polishing liquid and polishing method therewith | FUJIFILM CORP (JP) | 2008-07-30 | — | — | CN | disclosed |
| US-20070200089-A1 | Polishing liquid for metals | FUJIFILM CORPORATION | 2007-08-30 | — | — | US | disclosed |
| US-20070200089-A1 | Polishing liquid for metals | FUJIFILM CORPORATION | 2007-08-30 | — | — | US | disclosed |
| US-20070200089-A1 | Polishing liquid for metals | FUJIFILM CORPORATION | 2007-08-30 | — | — | US | disclosed |