Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 known ✓ | P23975 | 2/20 | 0.36 |
| ▸ | SLC6A3 known ✓ | Q01959 | 1/20 | 0.36 |
| ▸ | LTA4H | P09960 | 3/20 | 0.46 |
| ▸ | NTRK1 | P04629 | 1/20 | 0.41 |
| ▸ | NTRK3 | Q16288 | 1/20 | 0.41 |
| ▸ | NTRK2 | Q16620 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | CASP6 | P55212 | 1/20 | 0.39 |
| ▸ | AR | P10275 | 1/20 | 0.39 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.37 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | EGFR | P00533 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL5676621 | 0.90 | LTA4H (0.41) | LTA4HNTRK1NTRK3NTRK2POLB | |
| Sulfuric Acid SCHEMBL5676614 | 0.90 | LTA4H (0.41) | LTA4HNTRK1NTRK3NTRK2POLB | |
| Sulfuric Acid SCHEMBL5676625 | 0.88 | NTRK1 (0.39) | LTA4HNTRK1NTRK3NTRK2POLB | |
| Hydrochloric Acid SCHEMBL11879728 | 0.85 | MAPT (0.46) | ARL3MBTL1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL11064731 | 0.84 | MAPT (0.47) | ARL3MBTL1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL8083005 | 0.79 | TTR (0.49) | LTA4HNTRK1NTRK2ARL3MBTL1 | |
| Anisole SCHEMBL3801846 | 0.77 | CA4 (0.38) | LTA4HPOLBCASP6ARL3MBTL1 | |
| Hydrochloric Acid SCHEMBL9165477 | 0.75 | KMT2A (0.43) | L3MBTL1GAAALDH1A1 | |
| SCHEMBL11068289 | 0.74 | POLB (0.35) | LTA4HPOLBCASP6ARL3MBTL1 | |
| Trifluoromethanesulfonic Acid SCHEMBL11060910 | 0.73 | PTGS1 (0.38) | ARL3MBTL1SLC6A4GAAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8703092-B2 | Type separation of single-walled carbon nanotubes via two-phase liquid extraction | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 2014-04-22 | — | — | US | disclosed |
| US-20100166637-A1 | Type Separation of Single-Walled Carbon Nanotubes via Two-Phase Liquid Extraction | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. | 2010-07-01 | — | — | US | disclosed |
| WO-2008057070-A2 | TYPE SEPARATION OF SINGLE-WALLED CARBON NANOTUBES VIA PHASE TRANSFER | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 2008-05-15 | — | — | WO | disclosed |
| US-6861196-B2 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS LLC (US) | 2005-03-01 | — | — | US | disclosed |
| US-6821583-B2 | SUBSTRATE WITH A CROSSLINKED LAYER DISPOSED ON IT HAVING AN IMAGEABLE INK-RECEPTIVE LAYER THAT IS ABLATION FREE | KODAK POLYCHROME GRAPHICS LLC | 2004-11-23 | — | — | US | disclosed |
| US-6806020-B2 | PRINTING PLATE PATTERNS; MIXTURE OF ACID, ACID GENERATOR AND ACID CURABLE COMPOUND | KODAK POLYCHROME GRAPHICS LLC | 2004-10-19 | — | — | US | disclosed |
| US-20040063022-A1 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS, LLC. | 2004-04-01 | — | — | US | disclosed |
| US-20040009363-A1 | Substrate with a crosslinked layer disposed on it having an imageable ink-receptive layer that is ablation free | KODAK POLYCHROME GRAPHICS, L.L.C. (US) | 2004-01-15 | — | — | US | disclosed |
| US-6638679-B2 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS, LLC | 2003-10-28 | — | — | US | disclosed |
| US-20030082474-A1 | Printing plate patterns; mixture of acid, acid generator and acid curable compound | KODAK POLYCHROME GRAPHICS, L.L.C | 2003-05-01 | — | — | US | disclosed |
| WO-2003019293-A1 | NEGATIVE WORKING IMAGEABLE COMPOSITION CONTAINING SULFONIC ACID | KODAK POLYCHROME GRAPHICS, L.L.C. (US) | 2003-03-06 | — | — | WO | disclosed |
| WO-2003007076-A2 | PHOTOSENSITIVE COMPOSITIONS HAVING MIXTURES OF ALKOXY AND NON-ALKOXY DIAZONIUM SALT CONTAINING COMPOUNDS | KODAC POLYCHROME GRAPHICS, L.L.C. (US) | 2003-01-23 | — | — | WO | disclosed |
| US-20030013035-A1 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS, L.L.C. | 2003-01-16 | — | — | US | disclosed |
| US-20030007052-A1 | Method of preparing an inkjet ink imaged lithographic printing plate | KODAK POLYCHROME GRAPHICS, L.L.C. | 2003-01-09 | — | — | US | disclosed |
| WO-2002094571-A1 | A METHOD OF PREPARING AN INKJET INK IMAGED LITHOGRAPHIC PRINTING PLATE | KODAK POLYCHROME GRAPHICS, L.L.C. (US) | 2002-11-28 | — | — | WO | disclosed |
| US-4186017-A | Light-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-29 | — | — | US | disclosed |
| US-4021243-A | Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils | HOECHST AKTIENGESELLSCHAFT (DT) | 1977-05-03 | — | — | US | disclosed |