Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Anisole. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 5/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | LTA4H | P09960 | 2/20 | 0.35 |
| ▸ | PDE4A | P27815 | 1/20 | 0.34 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.34 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.34 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.34 |
| ▸ | MAOB | P27338 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 3/20 | 0.33 |
| ▸ | AR | P10275 | 1/20 | 0.33 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.33 |
| ▸ | CASP6 | P55212 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Anisole SCHEMBL5679467 | 0.89 | MAPT (0.39) | L3MBTL1MAPTMEN1KMT2AALDH1A1 | |
| Toluene SCHEMBL8493100 | 0.82 | L3MBTL1 (0.35) | L3MBTL1MAPTALDH1A1CYP1A2CYP2C19 | |
| Hydrochloric Acid SCHEMBL3798277 | 0.77 | LTA4H (0.46) | L3MBTL1LTA4HALDH1A1POLBAR | |
| Anisole SCHEMBL11744726 | 0.75 | LTA4H (0.44) | CA4L3MBTL1MAPTKMT2ALTA4H | |
| Hydrochloric Acid SCHEMBL3801844 | 0.72 | MEN1 (0.36) | L3MBTL1MAPTMEN1KMT2AALDH1A1 | |
| Hydrochloric Acid SCHEMBL9165477 | 0.71 | KMT2A (0.43) | L3MBTL1MAPTMEN1KMT2AALDH1A1 | |
| Toluene SCHEMBL7029684 | 0.71 | ACHE (0.34) | CA4MEN1KMT2AALDH1A1CYP1A2 | |
| SCHEMBL11068289 | 0.69 | POLB (0.35) | L3MBTL1MAPTLTA4HALDH1A1CYP1A2 | |
| Hydrochloric Acid SCHEMBL11120185 | 0.69 | PTPN1 (0.43) | L3MBTL1MAPTKMT2AALDH1A1POLB | |
| Sulfuric Acid SCHEMBL5676614 | 0.69 | LTA4H (0.41) | L3MBTL1MAPTMEN1KMT2ALTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8703092-B2 | Type separation of single-walled carbon nanotubes via two-phase liquid extraction | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 2014-04-22 | — | — | US | disclosed |
| US-20100166637-A1 | Type Separation of Single-Walled Carbon Nanotubes via Two-Phase Liquid Extraction | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. | 2010-07-01 | — | — | US | disclosed |
| WO-2008057070-A2 | TYPE SEPARATION OF SINGLE-WALLED CARBON NANOTUBES VIA PHASE TRANSFER | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 2008-05-15 | — | — | WO | disclosed |
| US-6861196-B2 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS LLC (US) | 2005-03-01 | — | — | US | disclosed |
| US-6821583-B2 | SUBSTRATE WITH A CROSSLINKED LAYER DISPOSED ON IT HAVING AN IMAGEABLE INK-RECEPTIVE LAYER THAT IS ABLATION FREE | KODAK POLYCHROME GRAPHICS LLC | 2004-11-23 | — | — | US | disclosed |
| US-6806020-B2 | PRINTING PLATE PATTERNS; MIXTURE OF ACID, ACID GENERATOR AND ACID CURABLE COMPOUND | KODAK POLYCHROME GRAPHICS LLC | 2004-10-19 | — | — | US | disclosed |
| US-20040063022-A1 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS, LLC. | 2004-04-01 | — | — | US | disclosed |
| US-20040009363-A1 | Substrate with a crosslinked layer disposed on it having an imageable ink-receptive layer that is ablation free | KODAK POLYCHROME GRAPHICS, L.L.C. (US) | 2004-01-15 | — | — | US | disclosed |
| US-6638679-B2 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS, LLC | 2003-10-28 | — | — | US | disclosed |
| US-20030082474-A1 | Printing plate patterns; mixture of acid, acid generator and acid curable compound | KODAK POLYCHROME GRAPHICS, L.L.C | 2003-05-01 | — | — | US | disclosed |
| WO-2003007076-A2 | PHOTOSENSITIVE COMPOSITIONS HAVING MIXTURES OF ALKOXY AND NON-ALKOXY DIAZONIUM SALT CONTAINING COMPOUNDS | KODAC POLYCHROME GRAPHICS, L.L.C. (US) | 2003-01-23 | — | — | WO | disclosed |
| US-20030013035-A1 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS, L.L.C. | 2003-01-16 | — | — | US | disclosed |
| EP-0428362-B1 | Photosensitive resin and element made therefrom | HOECHST CELANESE CORP (US) | 1995-04-19 | — | — | EP | disclosed |
| US-5200291-A | Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin | HOECHST CELANESE CORPORATION (US) | 1993-04-06 | — | — | US | disclosed |
| EP-0428362-A1 | Photosensitive resin and element made therefrom | HOECHST CELANESE CORPORATION (US) | 1991-05-22 | — | — | EP | disclosed |
| US-4914000-A | Three dimensional reproduction material diazonium condensates and use in light sensitive | HOECHST CELANESE CORPORATION (US) | 1990-04-03 | — | — | US | disclosed |
| EP-0326714-A2 | Three dimensional light-sensitive diazonium condensates | HOECHST CELANESE CORPORATION (US) | 1989-08-09 | — | — | EP | disclosed |
| US-4436804-A | Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith | AMERICAN HOECHST CORPORATION (US) | 1984-03-13 | — | — | US | disclosed |