Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.64 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.64 |
| ▸ | TSHR | P16473 | 3/20 | 0.63 |
| ▸ | TP53 | P04637 | 1/20 | 0.63 |
| ▸ | SRD5A2 | P31213 | 3/20 | 0.56 |
| ▸ | CA1 | P00915 | 3/20 | 0.52 |
| ▸ | CA2 | P00918 | 3/20 | 0.52 |
| ▸ | CA12 | O43570 | 1/20 | 0.52 |
| ▸ | CA3 | P07451 | 1/20 | 0.52 |
| ▸ | TYR | P14679 | 1/20 | 0.52 |
| ▸ | DRD1 | P21728 | 1/20 | 0.52 |
| ▸ | CA4 | P22748 | 1/20 | 0.52 |
| ▸ | CA6 | P23280 | 1/20 | 0.52 |
| ▸ | CA5A | P35218 | 1/20 | 0.52 |
| ▸ | CA7 | P43166 | 1/20 | 0.52 |
| ▸ | CA9 | Q16790 | 1/20 | 0.52 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.52 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.52 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | DAO | P14920 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL32665232 | 0.93 | RXRA (0.61) | ALDH1A1SMN1; SMN2TSHRTP53SRD5A2 | |
| Benzoic Acid SCHEMBL27685685 | 0.90 | TSHR (0.67) | ALDH1A1SMN1; SMN2TSHRTP53SRD5A2 | |
| Terephthalic Acid SCHEMBL1929898 | 0.89 | TSHR (0.71) | ALDH1A1SMN1; SMN2TSHRTP53SRD5A2 | |
| Terephthalic Acid SCHEMBL4438514 | 0.89 | TSHR (0.71) | ALDH1A1SMN1; SMN2TSHRTP53SRD5A2 | |
| Terephthalic Acid SCHEMBL28859780 | 0.84 | TSHR (0.63) | ALDH1A1SMN1; SMN2TSHRTP53SRD5A2 | |
| Terephthalic Acid SCHEMBL10736240 | 0.84 | TSHR (0.63) | ALDH1A1SMN1; SMN2TSHRTP53SRD5A2 | |
| Methacrylic Acid SCHEMBL10587357 | 0.84 | ALDH1A1 (0.44) | ALDH1A1SMN1; SMN2TSHRTP53SRD5A2 | |
| Terephthalic Acid SCHEMBL1366420 | 0.83 | TSHR (0.80) | ALDH1A1SMN1; SMN2TSHRTP53SRD5A2 | |
| Terephthalic Acid SCHEMBL123278 | 0.83 | TSHR (0.80) | ALDH1A1SMN1; SMN2TSHRTP53SRD5A2 | |
| Terephthalic Acid SCHEMBL28358071 | 0.83 | TSHR (0.80) | ALDH1A1SMN1; SMN2TSHRTP53SRD5A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 614 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022013049-A1 | METHOD FOR FABRICATING A PARTICLE | MERCK PATENT GMBH (DE) | 2022-01-20 | — | — | WO | claimed |
| WO-2021099233-A1 | METHOD FOR FABRICATING A PARTICLE | MERCK PATENT GMBH (DE) | 2021-05-27 | — | — | WO | claimed |
| US-9260628-B2 | Polyurea elastomers having increased chemicals resistance | BASF SE (DE) | 2016-02-16 | — | — | US | claimed |
| US-20140037855-A1 | POLYUREA ELASTOMERS HAVING INCREASED CHEMICALS RESISTANCE | BASF SE (DE) | 2014-02-06 | — | — | US | claimed |
| US-5166405-A | Polymers suitable for use as positive photoresists | CIBA-GEIGY CORPORATION (US) | 1992-11-24 | — | — | US | claimed |
| JP-62205106-A | — | — | None | — | — | JP | disclosed |
| JP-62002271-A | — | — | None | — | — | JP | disclosed |
| US-20250123563-A1 | POLYMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-04-17 | — | — | US | disclosed |
| CN-119823306-A | Polymer, resist composition including the same, and method of forming pattern using the same | 三星电子株式会社 | 2025-04-15 | — | — | CN | disclosed |
| EP-4508160-A1 | COMPOSITIONS COMPRISING POLYMER, SCALE INHIBITOR AND QUATERNARY AMMONIUM COMPOUND, METHOD AND USES | Independence Oilfield Chemicals, LLC (US) | 2025-02-19 | — | — | EP | disclosed |
| CN-119059905-A | Preparation method and application of vinyl benzoic acid fluorine-containing alkyl ester | 青岛大学 | 2024-12-03 | — | — | CN | disclosed |
| US-20240241458-A1 | TONER, DEVELOPING AGENT, TONER ACCOMMODATING UNIT, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD | RICOH COMPANY, LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| EP-0467841-A2 | Benzoic acid ester comprising an olefinically unsaturated substituant | CIBA-GEIGY AG (CH) | 1992-01-22 | — | — | EP | disclosed |
| US-4950422-A | FOR SUSPENSION POLYMERIZATION OF ETHYLENICALLY UNSATURATED COMPOUNDS | AKZONA INCORPORATED (US) | 1990-08-21 | — | — | US | disclosed |
| EP-0032757-B2 | AQUEOUS PEROXIDE EMULSION AND ITS USE IN SUSPENSION (CO)POLYMERIZATION REACTIONS | AKZO N.V. (NL) | 1990-03-07 | — | — | EP | disclosed |
| JP-S62205106-A | NOVEL LIVING POLYMER AND PRODUCTION THEREOF | MISHIMA SEISHI KK | 1987-09-09 | — | — | JP | disclosed |
| JP-S622271-A | TONER COMPOSITION FOR ELECTROPHOTOGRAPHY | MITSUI TOATSU CHEM INC | 1987-01-08 | — | — | JP | disclosed |
| US-4576838-A | ORGANOTIN POLYMER | MARINE SHIELD CORP. (US) | 1986-03-18 | — | — | US | disclosed |
| EP-0032757-B1 | AQUEOUS PEROXIDE EMULSION AND ITS USE IN SUSPENSION (CO)POLYMERIZATION REACTIONS | AKZO N.V. (NL) | 1983-03-23 | — | — | EP | disclosed |
| EP-0032757-A2 | Aqueous peroxide emulsion and its use in suspension (co)polymerization reactions | AKZO N.V. (NL) | 1981-07-29 | — | — | EP | disclosed |