SCHEMBL3816403

SCHEMBL3816403

CC(C)(C)c1cccc(-c2ccc(-c3ccc(O)cc3)cc2)c1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RXRA P19793 2/20 0.64
RXRB P28702 2/20 0.64
ESR1 P03372 6/20 0.61
MEN1 O00255 1/20 0.61
KMT2A Q03164 1/20 0.61
KIF11 P52732 1/20 0.61
HSD17B1 P14061 3/20 0.57
HSD17B2 P37059 3/20 0.57
ABL1 P00519 2/20 0.53
ABCB1 P08183 2/20 0.53
BCR P11274 2/20 0.53
LMNA P02545 1/20 0.52
TYR P14679 1/20 0.52
ESR2 Q92731 4/20 0.52
CYP3A4 P08684 2/20 0.50
CYP2C9 P11712 1/20 0.50
HDAC4 P56524 1/20 0.48
HDAC2 Q92769 1/20 0.48
HDAC8 Q9BY41 1/20 0.48
MMP3 P08254 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1513832 1.00 RXRA (0.64) RXRARXRBESR1MEN1KMT2A
Phenol SCHEMBL28874154 0.90 RXRA (0.62) RXRARXRBESR1MEN1KMT2A
SCHEMBL11223777 0.88 ESR1 (0.68) RXRARXRBESR1MEN1KMT2A
SCHEMBL27659191 0.87 KIF11 (0.76) RXRARXRBKIF11HDAC4HDAC2
SCHEMBL15394543 0.86 KIF11 (0.58) RXRARXRBESR1KIF11HSD17B1
SCHEMBL17105790 0.85 KIF11 (0.68) RXRARXRBKIF11HSD17B2HDAC4
SCHEMBL5547288 0.85 KIF11 (0.72) RXRARXRBKIF11HDAC4HDAC2
SCHEMBL30023786 0.85 KIF11 (0.72) RXRARXRBKIF11HDAC4HDAC2
SCHEMBL12004653 0.85 ESR1 (0.62) RXRARXRBESR1MEN1KMT2A
SCHEMBL21084882 0.83 ESR1 (0.66) RXRARXRBESR1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1375461-B1 DIPHENOL AND PROCESS FOR PRODUCING THE SAME HONSHU CHEMICAL IND (JP) 2009-08-05 EP disclosed
US-6872858-B2 Diphenol and process for producing the same HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2005-03-29 US disclosed
US-20040049086-A1 Diphenol and process for producing the same HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2004-03-11 US disclosed
EP-1375461-A1 DIPHENOL AND PROCESS FOR PRODUCING THE SAME Honshu Chemical Industry Co. Ltd. (JP) 2004-01-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040049086-A1 Diphenol and process for producing the same CYP1A1, AHR, CYP2E1 RXRA 1837/4885RXRB 2406/4885ESR1 489/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.