Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Tetraphenylphosphonium. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 1/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.38 |
| ▸ | CA12 | O43570 | 4/20 | 0.37 |
| ▸ | CA2 | P00918 | 4/20 | 0.37 |
| ▸ | CA9 | Q16790 | 4/20 | 0.37 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | CDC25B | P30305 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | CA3 | P07451 | 1/20 | 0.36 |
| ▸ | CA4 | P22748 | 1/20 | 0.36 |
| ▸ | CA6 | P23280 | 1/20 | 0.36 |
| ▸ | CA5A | P35218 | 1/20 | 0.36 |
| ▸ | CA7 | P43166 | 1/20 | 0.36 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetraphenylphosphonium SCHEMBL1271289 | 0.97 | HTR6 (0.38) | HTR6HIF1ACA12CA2CA9 | |
| Tetraphenylphosphonium SCHEMBL1271290 | 0.90 | TSHR (0.44) | HTR6HIF1ACA12CA2CA9 | |
| Tetraphenylphosphonium SCHEMBL19615045 | 0.90 | KEAP1 (0.39) | HTR6HIF1ACA12CA2CA9 | |
| Tetraphenylphosphonium SCHEMBL11324663 | 0.85 | HTR6 (0.33) | HTR6HIF1ACA12CA2CA9 | |
| Tetraphenylphosphonium SCHEMBL6507702 | 0.85 | HTR6 (0.33) | HTR6HIF1ACA12CA2CA9 | |
| Tetraphenylphosphonium SCHEMBL21957774 | 0.84 | GPR3 (0.50) | CA2CA9CA1CA5APTPN1 | |
| Tetraphenylphosphonium SCHEMBL29362652 | 0.82 | HIF1A (0.50) | HIF1ACA12CA2CA9ALDH1A1 | |
| Tetraphenylphosphonium SCHEMBL15813889 | 0.80 | HIF1A (0.39) | HIF1ACA2MEN1KMT2ACDC25B | |
| Tetraphenylphosphonium SCHEMBL2870352 | 0.79 | HIF1A (0.43) | HIF1AALDH1A1SMN1; SMN2TSHRHSD17B10 | |
| Sulfuric Acid SCHEMBL7643758 | 0.79 | CA12 (0.36) | HTR6HIF1ACA12CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090226616-A1 | FOUNTAIN SOLUTION COMPOSITION FOR LITHOGRAPHIC PRINTING AND HEAT-SET OFFSET ROTARY PRINTING PROCESS | FUJIFILM CORPORATION (JP) | 2009-09-10 | — | — | US | disclosed |
| EP-2098377-A2 | Fountain solution composition for lithographic printing and heat-set offset rotary printing process | FUJIFILM Corporation (JP) | 2009-09-09 | — | — | EP | disclosed |
| EP-1457838-A1 | Method to reduce precipitation in developers for lithographic printing plates | Fuji Photo Film B.V. (NL) | 2004-09-15 | — | — | EP | disclosed |
| EP-1455234-A1 | Method to reduce precipitation in developers for lithographic printing plates | Fuji Photo Film B.V. (NL) | 2004-09-08 | — | — | EP | disclosed |
| US-20020103328-A1 | Aromatic polycarbonate composition, production process therefor and molded product thereof | TEIJIN LIMITED | 2002-08-01 | — | — | US | disclosed |
| US-5837425-A | PRESENSITIZATION OF PLATES, SUPPORTS, MULTILAYER, EXPOSURE TO ACTINIC RADIATION OF FILMS, DEVELOPMENT OF PLATES WITH ALKALI | FUJI PHOTO FILM CO., LTD. (JP) | 1998-11-17 | — | — | US | disclosed |
| US-5580704-A | CONTAINING BASIC DYE, ORGANIC SOLVENT HAVING LOW WATER SOLUBILITY, HYDROTROPE AGENT, ANIONIC SURFACTANT; HIGH DYE DENSITY, LOW FOAMABILITY, NONPRECIPITATING, NONSTAINING | FUJI PHOTO FILM CO., LTD. (JP) | 1996-12-03 | — | — | US | disclosed |
| EP-0716347-A1 | Developer for photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1996-06-12 | — | — | EP | disclosed |
| EP-0516372-B1 | Concentrated dampening water composition for lithographic printing | FUJI PHOTO FILM CO LTD (JP) | 1996-04-24 | — | — | EP | disclosed |
| EP-0652489-A1 | Process for processing a photosensitive lithographic printing plate requiring no fountain solution | FUJI PHOTO FILM CO., LTD. (JP) | 1995-05-10 | — | — | EP | disclosed |
| US-5221330-A | Hydrophilic film-forming polymer, buffer, water miscible organic solvent, micelle-forming compound, water | FUJI PHOTO FILM CO., LTD. (JP) | 1993-06-22 | — | — | US | disclosed |
| EP-0516372-A1 | Concentrated dampening water composition for lithographic printing | FUJI PHOTO FILM CO., LTD. (JP) | 1992-12-02 | — | — | EP | disclosed |
| US-4124630-A | Process for the production of chloromethyl thiocyanate | OFFERMANNS HERIBERT | 1978-11-07 | — | — | US | disclosed |