Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.47 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.44 |
| ▸ | NAAA | Q02083 | 11/20 | 0.43 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13313166 | 0.98 | CYP1A2 (0.54) | CYP1A2SIGMAR1EPHX1NAAAFKBP1A | |
| SCHEMBL30203249 | 0.98 | SIGMAR1 (0.50) | CYP1A2SIGMAR1EPHX1NAAAFKBP1A | |
| SCHEMBL18414169 | 0.98 | SIGMAR1 (0.50) | CYP1A2SIGMAR1EPHX1NAAAFKBP1A | |
| SCHEMBL13313184 | 0.96 | SIGMAR1 (0.54) | CYP1A2SIGMAR1EPHX1NAAAFKBP1A | |
| SCHEMBL27625119 | 0.96 | SIGMAR1 (0.54) | CYP1A2SIGMAR1EPHX1NAAAFKBP1A | |
| SCHEMBL6076883 | 0.93 | CYP1A2 (0.52) | CYP1A2SIGMAR1EPHX1NAAAFKBP1A | |
| SCHEMBL11157147 | 0.91 | CYP1A2 (0.56) | CYP1A2SIGMAR1EPHX1NAAAFKBP1A | |
| SCHEMBL12745051 | 0.90 | — | — | |
| Ammonia Solution, Strong SCHEMBL7862370 | 0.88 | CYP1A2 (0.54) | CYP1A2SIGMAR1EPHX1NAAAFKBP1A | |
| SCHEMBL23471287 | 0.88 | SIGMAR1 (0.39) | CYP1A2SIGMAR1EPHX1NAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 376 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11693314-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| US-11340527-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-05-24 | — | — | US | claimed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240184200-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-06 | — | — | US | disclosed |
| CN-118112887-A | Resist composition and pattern forming method | 信越化学工业株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-118005520-A | Amine compound, chemically amplified resist composition, and pattern forming method | 信越化学工业株式会社 | 2024-05-10 | — | — | CN | disclosed |
| US-11953827-B2 | Molecular resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-09 | — | — | US | disclosed |
| US-20230280651-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-07 | — | — | US | disclosed |
| CN-111123651-B | Composition for forming substrate protective film and pattern forming method | 信越化学工业株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-111793054-B | Sulfonium compound, chemically amplified resist composition, and pattern forming method | 信越化学工业株式会社 | 2023-07-07 | — | — | CN | disclosed |
| US-11693314-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-20030091929-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-15 | — | — | US | disclosed |
| US-20030087181-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-08 | — | — | US | disclosed |
| US-20030087183-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-08 | — | — | US | disclosed |
| US-20030054289-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-03-20 | — | — | US | disclosed |
| US-20030054290-A1 | Polymer, resist material and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-03-20 | — | — | US | disclosed |
| US-20030050398-A1 | Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-03-13 | — | — | US | disclosed |
| US-20030036603-A1 | Novel epoxy compound having alicyclic structure, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-02-20 | — | — | US | disclosed |
| US-20020061463-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-23 | — | — | US | disclosed |
| EP-1195390-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-10 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11340527-B2 | Resist composition and patterning process | EIF2B1, EIF2B5, WDR1 | CYP1A2 2800/4885SIGMAR1 1017/4885EPHX1 357/4885 |
| US-20240184200-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | ADAR, HNRNPU, POLQ | CYP1A2 4030/4885SIGMAR1 497/4885EPHX1 2910/4885 |
| US-20230280651-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | EIF2B1, EIF2B5, EIF2B3 | CYP1A2 2704/4885SIGMAR1 987/4885EPHX1 375/4885 |
| US-11693314-B2 | Resist composition and patterning process | EIF2B1, EIF2B5, EIF2B3 | CYP1A2 2704/4885SIGMAR1 987/4885EPHX1 375/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.