SCHEMBL3829786

SCHEMBL3829786

O=S(=O)(O)Oc1cccc(OS(=O)(=O)O)c1OS(=O)(=O)O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FABP1 P07148 1/20 0.49
SLC22A6 Q4U2R8 1/20 0.44
INPPL1 O15357 1/20 0.35
INPP5B P32019 1/20 0.35
INPP5A Q14642 1/20 0.35
CA5A P35218 1/20 0.35
F10 P00742 2/20 0.34
ELANE P08246 1/20 0.33
METAP2 P50579 1/20 0.33
METAP1 P53582 1/20 0.33
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA9 Q16790 2/20 0.32
TSHR P16473 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
GAA P10253 4/20 0.32
KMT2A Q03164 3/20 0.32
MEN1 O00255 2/20 0.32
ESR1 P03372 2/20 0.32
ESR2 Q92731 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methane SCHEMBL6810793 0.98 FABP1 (0.47) FABP1SLC22A6INPPL1INPP5BINPP5A
SCHEMBL1890372 0.87 FABP1 (0.41) FABP1SLC22A6CA1CA2CA9
SCHEMBL17466328 0.87 FABP1 (0.41) FABP1SLC22A6
SCHEMBL8822555 0.86 FABP1 (0.40) FABP1SLC22A6INPPL1INPP5BINPP5A
SCHEMBL14015373 0.85 CA2 (0.45) FABP1CA5ACA1CA2CA9
SCHEMBL514247 0.82 SLC22A6 (0.53) FABP1SLC22A6CA5AELANECA1
SCHEMBL6747882 0.82 FABP1 (0.63) FABP1SLC22A6CA5AMETAP2METAP1
SCHEMBL10647420 0.81 SLC22A6 (0.53) FABP1SLC22A6CA5AELANESMN1; SMN2
SCHEMBL1882763 0.80 SLC22A6 (0.52) FABP1SLC22A6CA5AELANECA1
Ammonia Solution, Strong SCHEMBL1278643 0.80 SLC22A6 (0.52) FABP1SLC22A6CA5AELANECA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023058368-A1 METHOD FOR PRODUCING GLASS SUBSTRATE, PRETREATMENT METHOD FOR GLASS SUBSTRATE, AND METHOD FOR PRODUCING MULTILAYER BODY COMPRISING GLASS SUBSTRATE 日産化学株式会社 2023-04-13 WO disclosed
WO-2023013727-A1 RIBBED SUBSTRATE AND OPTICAL SEMICONDUCTOR DEVICE 株式会社カネカ 2023-02-09 WO disclosed
WO-2022210799-A1 SUBSTRATE STACK, IMAGE SENSOR, AND METHOD FOR MANUFACTURING SUBSTRATE STACK 株式会社カネカ 2022-10-06 WO disclosed
WO-2022210798-A1 OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC APPARATUS 株式会社カネカ 2022-10-06 WO disclosed
CN-106024592-B Silicon-based interlayer composition and related methods 台湾积体电路制造股份有限公司 2019-07-12 CN disclosed
CN-106024592-A Silicon-based interlayer composition and related methods 台湾积体电路制造股份有限公司 2016-10-12 CN disclosed
US-20160027592-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTRICITY STORAGE DEVICE USING SAME UBE INDUSTRIES, LTD. (JP) 2016-01-28 US disclosed
US-8795942-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-05 US disclosed
US-20090252932-A1 ACTINIC ENERGY RAY CURABLE RESION COMPOSITION AND USE THEREOF KURARAY CO., LTD. (JP) 2009-10-08 US disclosed
EP-1449833-B1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION WAKO PURE CHEM IND LTD (JP) 2009-09-09 EP disclosed
US-20080153030-A1 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-26 US disclosed
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20070189671-A1 Method for manufacturing optical waveguide chip SR CORPORATION (JP) 2007-08-16 US disclosed
CN-1238766-C Positive type radiation-sensitive composition and method for forming pattern JSR CORP (JP) 2006-01-25 CN disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed
CN-1507580-A Positive type radiation-sensitive composition and method for forming pattern JSR株式会社 2004-06-23 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 FABP1 4396/4885SLC22A6 4163/4885INPPL1 1393/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.