Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.33 |
| ▸ | CTSK | P43235 | 2/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.33 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.33 |
| ▸ | PPARD | Q03181 | 4/20 | 0.32 |
| ▸ | PPARA | Q07869 | 4/20 | 0.32 |
| ▸ | PPARG | P37231 | 2/20 | 0.32 |
| ▸ | CYP24A1 | Q07973 | 1/20 | 0.31 |
| ▸ | BCHE | P06276 | 1/20 | 0.31 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.30 |
| ▸ | HTR2A | P28223 | 1/20 | 0.30 |
| ▸ | MAOB | P27338 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6552052 | 0.91 | CYP3A4 (0.35) | CYP3A4CTSKCYP1A2CYP2D6CYP2C9 | |
| SCHEMBL4968047 | 0.89 | CTSK (0.33) | CYP3A4CTSKCYP1A2CYP2D6CYP2C9 | |
| SCHEMBL7265017 | 0.89 | PPARG (0.37) | CTSKCYP1A2CYP2C19LMNAPPARA | |
| SCHEMBL6278450 | 0.86 | CYP1A1 (0.32) | CYP3A4LMNABCHEACHEPTGS2 | |
| SCHEMBL4967712 | 0.86 | ELANE (0.34) | CYP3A4LMNAPPARDPPARAPPARG | |
| SCHEMBL3842762 | 0.86 | PPARG (0.33) | PPARDPPARAPPARG | |
| SCHEMBL5454889 | 0.85 | CTSK (0.36) | CYP3A4CTSKCYP1A2CYP2D6CYP2C9 | |
| SCHEMBL6551257 | 0.84 | BCHE (0.35) | CYP3A4LMNABCHEACHEPTGS2 | |
| SCHEMBL6278092 | 0.84 | KDM4E (0.36) | CTSKPPARDPPARAPPARGBCHE | |
| SCHEMBL3844773 | 0.83 | ACACB (0.32) | CYP3A4CYP1A2CYP2D6CYP2C9NFKB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0875787-B1 | Method for reducing the substrate dependence of resist | WAKO PURE CHEM IND LTD (JP) | 2005-12-14 | — | — | EP | claimed |
| EP-1449833-B1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2009-09-09 | — | — | EP | disclosed |
| EP-1314725-B1 | SULFONIUM SALT COMPOUND | WAKO PURE CHEM IND LTD (JP) | 2008-03-19 | — | — | EP | disclosed |
| EP-0875787-B1 | Method for reducing the substrate dependence of resist | WAKO PURE CHEM IND LTD (JP) | 2005-12-14 | — | — | EP | disclosed |
| US-6924323-B2 | Sulfonium salt compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2005-08-02 | — | — | US | disclosed |
| EP-0789279-B2 | Polymer and resist material | WAKO PURE CHEM IND LTD (JP) | 2004-12-08 | — | — | EP | disclosed |
| EP-1449833-A1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |
| US-6723483-B1 | Sulfonium salt compounds | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2004-04-20 | — | — | US | disclosed |
| US-20040033434-A1 | Sulfonium salt compound | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2004-02-19 | — | — | US | disclosed |
| US-6656660-B1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-12-02 | — | — | US | disclosed |
| EP-0675410-B1 | Resist composition for deep ultraviolet light | WAKO PURE CHEM IND LTD (JP) | 1999-08-04 | — | — | EP | disclosed |
| EP-0875787-A1 | Method for reducing the substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 1998-11-04 | — | — | EP | disclosed |
| US-5780206-A | USING AN ANTHRACENE DERIVATIVE AS AN ABSORBER ON HIGHLY REFLECTIVE SURFACES; ALKALI-SOLUBLE POLYMERS; GENERATION OF ACID CATALYSTS; FINE PATTERNS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1998-07-14 | — | — | US | disclosed |
| US-5695910-A | RESIN BECOMES ALKALI SOLUBLE BY ELIMINATING PROTECTIVE GROUPS BY ACTION OF IN SITU GENERATED ACID | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-12-09 | — | — | US | disclosed |
| EP-0789279-A1 | Polymer and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0780732-A2 | Polymer composition and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-06-25 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| EP-0675410-A1 | Resist composition for deep ultraviolet light | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-10-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040033434-A1 | Sulfonium salt compound | SPIN1, RER1, SPIN2B | CYP3A4 2460/4885CTSK 3904/4885CYP1A2 1973/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.