Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL384390 | 0.74 | — | — | |
| SCHEMBL650899 | 0.73 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL8176889 | 0.72 | HSD11B1 (0.30) | HSD11B1 | |
| SCHEMBL6339275 | 0.72 | — | — | |
| SCHEMBL16593822 | 0.72 | — | — | |
| SCHEMBL4897289 | 0.70 | — | — | |
| SCHEMBL2761577 | 0.69 | HSD11B1 (0.38) | HSD11B1ALOX5AP | |
| SCHEMBL8733039 | 0.67 | HSD11B1 (0.37) | HSD11B1ALOX5AP | |
| SCHEMBL28770909 | 0.67 | HSD11B1 (0.37) | HSD11B1ALOX5AP | |
| SCHEMBL27660399 | 0.67 | HSD11B1 (0.37) | HSD11B1ALOX5AP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 184 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230250279-A1 | HARD COATING COMPOSITION AND WINDOW MEMBER | SAMSUNG DISPLAY CO., LTD. (KR) | 2023-08-10 | — | — | US | claimed |
| US-7670750-B2 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-02 | — | — | US | claimed |
| EP-1150166-B1 | Polymers, resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2007-12-19 | — | — | EP | claimed |
| JP-1223107-A | — | — | None | — | — | JP | disclosed |
| US-12002988-B2 | Porous film including porous base and porous layer having inorganic particles and resin particles containing fluoro (meth)acrylate-containing or silicon-containing polymer, separator for secondary batteries, and secondary battery | TORAY INDUSTRIES, INC. (JP) | 2024-06-04 | — | — | US | disclosed |
| US-20240134187-A1 | OPTICAL ELEMENT, IMAGE DISPLAY DEVICE, VIRTUAL REALITY DISPLAY DEVICE, ELECTRONIC VIEWFINDER, METHOD OF PRODUCING POLARIZER | FUJIFILM CORPORATION (JP) | 2024-04-25 | — | — | US | disclosed |
| US-11939462-B2 | Functional film, polarizing plate, and display device | FUJIFILM CORPORATION (JP) | 2024-03-26 | — | — | US | disclosed |
| US-11914140-B2 | Optical element, image display device, virtual reality display device, electronic viewfinder, method of producing polarizer | FUJIFILM CORPORATION (JP) | 2024-02-27 | — | — | US | disclosed |
| WO-2023188609-A1 | ANTIFOULING TREATMENT AGENT, ANTIFOULING TREATMENT AGENT STOCK SOLUTION, AND ANTIFOULING TREATMENT METHOD | パナソニックＩＰマネジメント株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-20230314679-A1 | LAMINATED OPTICAL FILM AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230305209-A1 | OPTICAL LAMINATE, POLARIZING PLATE, AND IMAGE DEVICE DISPLAY | FUJIFILM CORPORATION (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20030088115-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-08 | — | — | US | disclosed |
| US-20030087183-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-08 | — | — | US | disclosed |
| US-20020197559-A1 | Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-12-26 | — | — | US | disclosed |
| US-20020147290-A1 | Cyclic acetal compound, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-10-10 | — | — | US | disclosed |
| US-20020132182-A1 | Polymers, resist materials, and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-09-19 | — | — | US | disclosed |
| US-20020102493-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-01 | — | — | US | disclosed |
| US-6413695-B1 | ENANTIOMORPHS; EXPOSURE, DEVELOPMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-02 | — | — | US | disclosed |
| EP-1148044-A1 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-24 | — | — | EP | disclosed |
| JP-H01223107-A | CURABLE COMPOSITION | KANSAI PAINT CO LTD | 1989-09-06 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030088115-A1 | Novel ester compounds, polymers, resist compositions and patterning process | RER1, ARCN1, H1-0 | HSD11B1 1171/4885ALOX5AP 2485/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.