SCHEMBL650899

SCHEMBL650899

C=CC(=O)OC1(C(=O)O)CC2CCC1C2

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL655346 0.80
SCHEMBL8176889 0.77 HSD11B1 (0.30) HSD11B1
SCHEMBL9060774 0.76 TSHR (0.46)
SCHEMBL21524625 0.76
SCHEMBL8942356 0.76
SCHEMBL825347 0.76
SCHEMBL4399244 0.74
SCHEMBL384200 0.73 HSD11B1 (0.33) HSD11B1
SCHEMBL4403853 0.73
SCHEMBL5907602 0.73 HSD11B1 (0.30) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150183912-A1 (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT NEC CORPORATION (JP) 2015-07-02 US disclosed
US-8969483-B2 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it NEC CORPORATION (JP) 2015-03-03 US disclosed
US-8802783-B2 2014-08-12 US disclosed
US-8802798-B2 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it NEC CORPORATION (JP) 2014-08-12 US disclosed
US-20130122419-A1 (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT NEC CORPORATION (JP) 2013-05-16 US disclosed
US-20120178023-A1 (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT NEC CORPORATION 2012-07-12 US disclosed
US-8119751-B2 2012-02-21 US disclosed
US-20110196122-A1 (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT NEC CORPORATION 2011-08-11 US disclosed
US-20090023878-A1 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it NEC CORPORATION 2009-01-22 US disclosed
US-7432035-B2 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it NEC CORPORATION (JP) 2008-10-07 US disclosed
US-20070218403-A1 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it NEC CORPORATION 2007-09-20 US disclosed
US-7186495-B2 (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it NEC CORPORATION (JP) 2007-03-06 US disclosed
US-20010026901-A1 (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it NEC CORPORATION (JP) 2001-10-04 US disclosed